Understanding and control of lateral contraction in stamping lithography

Zheng Li, Li Tan, Gang-yu Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Thin film contraction under external mechanical stress can be used to miniaturize size and increase density of patterned features on top. Nonlinear Finite Element Analysis is used to provide guidance on this contraction process. It was found that the substrate contraction causes stress accumulation along interfaces between protruded features and substrate. These stress accumulation complexes the control of profile changes on patterned features and suggest a design of patterned features arranged beyond a critical distance to avoid cross-interference.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
Pages36-41
Number of pages6
Volume921
StatePublished - 2006
Event2006 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 17 2006Apr 21 2006

Other

Other2006 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/17/064/21/06

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Understanding and control of lateral contraction in stamping lithography'. Together they form a unique fingerprint.

  • Cite this

    Li, Z., Tan, L., & Liu, G. (2006). Understanding and control of lateral contraction in stamping lithography. In Materials Research Society Symposium Proceedings (Vol. 921, pp. 36-41)