Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses

Stavros G. Demos, Rajesh N. Raman, Raluca A. Negres

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

We study the dynamics of energy deposition and subsequent material response associated with exit surface damage growth in fused silica using a time resolved microscope system. This system enables acquisition of two transient images per damage event with temporal resolution of 180 ps and spatial resolution on the order of 1 μ m. The experimental results address important issues in laser damage growth that include: a) the specific structural features within a damage site where plasma formation initiates; b) the subsequent growth of the plasma regions; c) the formation and expansion of radial and circumferential cracks; d) the kinetics and duration of material ejection; e) the characteristics of the generated shockwave.

Original languageEnglish (US)
Pages (from-to)4875-4888
Number of pages14
JournalOptics Express
Volume21
Issue number4
DOIs
StatePublished - Feb 25 2013
Externally publishedYes

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Silicon Dioxide
Lasers
silicon dioxide
damage
Growth
pulses
lasers
laser damage
temporal resolution
ejection
acquisition
cracks
spatial resolution
microscopes
expansion
kinetics
energy

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Medicine(all)

Cite this

Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses. / Demos, Stavros G.; Raman, Rajesh N.; Negres, Raluca A.

In: Optics Express, Vol. 21, No. 4, 25.02.2013, p. 4875-4888.

Research output: Contribution to journalArticle

Demos, Stavros G. ; Raman, Rajesh N. ; Negres, Raluca A. / Time-resolved imaging of processes associated with exit-surface damage growth in fused silica following exposure to nanosecond laser pulses. In: Optics Express. 2013 ; Vol. 21, No. 4. pp. 4875-4888.
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