The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

Richard K. Baldwin, Jing Zou, Katherine A. Pettigrew, Gregory J. Yeagle, R. David Britt, Susan M. Kauzlarich

Research output: Contribution to journalArticle

42 Scopus citations

Abstract

Phosphorus containing and octyl-terminated silicon nanoparticles (NPs) are generated by a solution reduction route under room temperature conditions for the first time and characterized by TEM, HRTEM, EDX, 1H/13C/31P NMR, EPR, and PL spectroscopy, then annealed to form a thin film with phosphorus doping confirmed by microprobe elemental analyses.

Original languageEnglish (US)
Pages (from-to)658-660
Number of pages3
JournalChemical Communications
Volume6
Issue number6
DOIs
StatePublished - 2006

ASJC Scopus subject areas

  • Chemistry(all)

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    Baldwin, R. K., Zou, J., Pettigrew, K. A., Yeagle, G. J., Britt, R. D., & Kauzlarich, S. M. (2006). The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles. Chemical Communications, 6(6), 658-660. https://doi.org/10.1039/b513330k