Substrate topography guides pore morphology evolution in nanoporous gold thin films

Christopher A.R. Chapman, Pallavi Daggumati, Shannon C. Gott, Masaru P. Rao, Erkin Seker

Research output: Contribution to journalArticle

3 Scopus citations

Abstract

This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150 nm and 50 μm were fabricated and coated with 500 nm-thick np-Au films obtained by dealloying sputtered gold-silver alloy films. Analysis of scanning electron micrographs of the np-Au films following dealloying and thermal annealing revealed two distinct regimes where the ratio of film thickness to ridge width determines the morphological evolution of np-Au films.

Original languageEnglish (US)
Pages (from-to)33-36
Number of pages4
JournalScripta Materialia
Volume110
DOIs
StatePublished - Jan 1 2016

Keywords

  • Annealing
  • Dealloying
  • Fracture
  • Microfabrication
  • Nanoporous material

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics

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