Substrate suppression of thermal roughness in stacked supported bilayers

Curt M. Decaro, Justin D. Berry, Laurence B. Lurio, Yicong Ma, Gang Chen, Sunil Sinha, Lobat Tayebi, Atul N. Parikh, Zhang Jiang, Alec R. Sandy

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

We have fabricated a stack of five 1,2-dipalmitoyl-sn-3- phosphatidylethanolamine (DPPE) bilayers supported on a polished silicon substrate in excess water. The density profile of these stacks normal to the substrate was obtained through analysis of x-ray reflectivity. Near the substrate, we find the layer roughness and repeat spacing are both significantly smaller than values found in bulk multilayer systems. The reduced spacing and roughness result from suppression of lateral fluctuations due to the flat substrate boundary. The layer spacing decrease then occurs due to reduced Helfrich repulsion.

Original languageEnglish (US)
Article number041914
JournalPhysical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume84
Issue number4
DOIs
StatePublished - Oct 13 2011

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Statistical and Nonlinear Physics
  • Statistics and Probability

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  • Cite this

    Decaro, C. M., Berry, J. D., Lurio, L. B., Ma, Y., Chen, G., Sinha, S., Tayebi, L., Parikh, A. N., Jiang, Z., & Sandy, A. R. (2011). Substrate suppression of thermal roughness in stacked supported bilayers. Physical Review E - Statistical, Nonlinear, and Soft Matter Physics, 84(4), [041914]. https://doi.org/10.1103/PhysRevE.84.041914