Substrate suppression of thermal roughness in stacked supported bilayers

Curt M. Decaro, Justin D. Berry, Laurence B. Lurio, Yicong Ma, Gang Chen, Sunil Sinha, Lobat Tayebi, Atul N. Parikh, Zhang Jiang, Alec R. Sandy

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

We have fabricated a stack of five 1,2-dipalmitoyl-sn-3- phosphatidylethanolamine (DPPE) bilayers supported on a polished silicon substrate in excess water. The density profile of these stacks normal to the substrate was obtained through analysis of x-ray reflectivity. Near the substrate, we find the layer roughness and repeat spacing are both significantly smaller than values found in bulk multilayer systems. The reduced spacing and roughness result from suppression of lateral fluctuations due to the flat substrate boundary. The layer spacing decrease then occurs due to reduced Helfrich repulsion.

Original languageEnglish (US)
Article number041914
JournalPhysical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume84
Issue number4
DOIs
StatePublished - Oct 13 2011

Fingerprint

Roughness
roughness
Substrate
retarding
Spacing
spacing
Density Profile
Reflectivity
Excess
Multilayer
Lateral
Silicon
Fluctuations
reflectance
Water
Decrease
silicon
profiles
water
x rays

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Statistical and Nonlinear Physics
  • Statistics and Probability

Cite this

Substrate suppression of thermal roughness in stacked supported bilayers. / Decaro, Curt M.; Berry, Justin D.; Lurio, Laurence B.; Ma, Yicong; Chen, Gang; Sinha, Sunil; Tayebi, Lobat; Parikh, Atul N.; Jiang, Zhang; Sandy, Alec R.

In: Physical Review E - Statistical, Nonlinear, and Soft Matter Physics, Vol. 84, No. 4, 041914, 13.10.2011.

Research output: Contribution to journalArticle

Decaro, CM, Berry, JD, Lurio, LB, Ma, Y, Chen, G, Sinha, S, Tayebi, L, Parikh, AN, Jiang, Z & Sandy, AR 2011, 'Substrate suppression of thermal roughness in stacked supported bilayers', Physical Review E - Statistical, Nonlinear, and Soft Matter Physics, vol. 84, no. 4, 041914. https://doi.org/10.1103/PhysRevE.84.041914
Decaro, Curt M. ; Berry, Justin D. ; Lurio, Laurence B. ; Ma, Yicong ; Chen, Gang ; Sinha, Sunil ; Tayebi, Lobat ; Parikh, Atul N. ; Jiang, Zhang ; Sandy, Alec R. / Substrate suppression of thermal roughness in stacked supported bilayers. In: Physical Review E - Statistical, Nonlinear, and Soft Matter Physics. 2011 ; Vol. 84, No. 4.
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