Spectroscopic investigation of SiO 2 surfaces of optical materials for high power lasers

S. G. Demos, L. Sheehan, M. R. Kozlowski

Research output: Chapter in Book/Report/Conference proceedingConference contribution

15 Scopus citations

Abstract

High quality surfaces of fused silica optical materials were studied using microscopic fluorescence imaging as well as Raman and emission micro-spectroscopy. For as-polished surfaces optically active defect formations were detected on the surface of the material which vary in geometry, relative intensity and concentration depending on the polishing process. A partial correlation of these defects with subsequent laser damage sites was indicated. Following laser-induced damage the Raman and photoluminescence spectra indicated extensive material modification within the damage site. Emission spectra show at least three characteristic luminescence bands centered at 1.9 eV (650 nm), 2.2 eV (560 nm) and approximately 4.7 eV (approximately 440 nm). Raman scattering indicates that laser irradiation leads to compaction.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages316-320
Number of pages5
Volume3933
StatePublished - 2000
Externally publishedYes
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing V - San Jose, CA, USA
Duration: Jan 24 2000Jan 26 2000

Other

OtherLaser Applications in Microelectronic and Optoelectronic Manufacturing V
CitySan Jose, CA, USA
Period1/24/001/26/00

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ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Demos, S. G., Sheehan, L., & Kozlowski, M. R. (2000). Spectroscopic investigation of SiO 2 surfaces of optical materials for high power lasers In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 3933, pp. 316-320). Society of Photo-Optical Instrumentation Engineers.