Scanning probe lithography of self-assembled monolayers

Guohua Yang, Nabil A. Amro, Gang-yu Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Scopus citations

Abstract

Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsE.A. Dobisz
Pages52-65
Number of pages14
Volume5220
StatePublished - 2003
EventNanofabrication Technologies - San Diego, CA, United States
Duration: Aug 3 2003Aug 4 2003

Other

OtherNanofabrication Technologies
CountryUnited States
CitySan Diego, CA
Period8/3/038/4/03

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Keywords

  • Atomic force microscopy
  • Nanofabrication
  • Scanning probe lithography
  • Scanning tunneling microscopy
  • Self-assembled monolayers
  • Thiol

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Yang, G., Amro, N. A., & Liu, G. (2003). Scanning probe lithography of self-assembled monolayers. In E. A. Dobisz (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5220, pp. 52-65)