Scanning probe lithography of self-assembled monolayers

Guohua Yang, Nabil A. Amro, Gang-yu Liu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Citations (Scopus)

Abstract

Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsE.A. Dobisz
Pages52-65
Number of pages14
Volume5220
StatePublished - 2003
EventNanofabrication Technologies - San Diego, CA, United States
Duration: Aug 3 2003Aug 4 2003

Other

OtherNanofabrication Technologies
CountryUnited States
CitySan Diego, CA
Period8/3/038/4/03

Fingerprint

nanofabrication
Self assembled monolayers
Nanotechnology
Lithography
surface reactions
Desorption
lithography
desorption
Scanning
Electron tunneling
scanning
probes
Scanning tunneling microscopy
readers
electron tunneling
scanning tunneling microscopy
Atomic force microscopy
Electric fields
atomic force microscopy
methodology

Keywords

  • Atomic force microscopy
  • Nanofabrication
  • Scanning probe lithography
  • Scanning tunneling microscopy
  • Self-assembled monolayers
  • Thiol

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Yang, G., Amro, N. A., & Liu, G. (2003). Scanning probe lithography of self-assembled monolayers. In E. A. Dobisz (Ed.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 5220, pp. 52-65)

Scanning probe lithography of self-assembled monolayers. / Yang, Guohua; Amro, Nabil A.; Liu, Gang-yu.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / E.A. Dobisz. Vol. 5220 2003. p. 52-65.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yang, G, Amro, NA & Liu, G 2003, Scanning probe lithography of self-assembled monolayers. in EA Dobisz (ed.), Proceedings of SPIE - The International Society for Optical Engineering. vol. 5220, pp. 52-65, Nanofabrication Technologies, San Diego, CA, United States, 8/3/03.
Yang G, Amro NA, Liu G. Scanning probe lithography of self-assembled monolayers. In Dobisz EA, editor, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 5220. 2003. p. 52-65
Yang, Guohua ; Amro, Nabil A. ; Liu, Gang-yu. / Scanning probe lithography of self-assembled monolayers. Proceedings of SPIE - The International Society for Optical Engineering. editor / E.A. Dobisz. Vol. 5220 2003. pp. 52-65
@inproceedings{d09e08fca5e845029601102a5548ee4b,
title = "Scanning probe lithography of self-assembled monolayers",
abstract = "Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.",
keywords = "Atomic force microscopy, Nanofabrication, Scanning probe lithography, Scanning tunneling microscopy, Self-assembled monolayers, Thiol",
author = "Guohua Yang and Amro, {Nabil A.} and Gang-yu Liu",
year = "2003",
language = "English (US)",
volume = "5220",
pages = "52--65",
editor = "E.A. Dobisz",
booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

}

TY - GEN

T1 - Scanning probe lithography of self-assembled monolayers

AU - Yang, Guohua

AU - Amro, Nabil A.

AU - Liu, Gang-yu

PY - 2003

Y1 - 2003

N2 - Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

AB - Systematic studies on scanning probe lithography (SPL) methodologies have been performed using self-assembled monolayers (SAMs) on Au as examples. The key to achieving high spatial precision is to keep the tip-surface interactions strong and local. Approaches include three atomic force microscopy (AFM) based methods, nanoshaving, nanografting, and nanopen reader and writer (NPRW), which rely on the local force, and two scanning tunneling microscopy (STM) based techniques, field-induced desorption and electron-induced desorption, which use electric field and tunneling electrons, respectively, for nanofabrication. The principle of these procedures, the critical steps in controlling local tip-surface interactions, and nanofabrication media will be discussed. The advantages of SPL will be illustrated through various examples of production and modification of SAM nanopatterns.

KW - Atomic force microscopy

KW - Nanofabrication

KW - Scanning probe lithography

KW - Scanning tunneling microscopy

KW - Self-assembled monolayers

KW - Thiol

UR - http://www.scopus.com/inward/record.url?scp=1242331012&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1242331012&partnerID=8YFLogxK

M3 - Conference contribution

VL - 5220

SP - 52

EP - 65

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Dobisz, E.A.

ER -