Abstract
We show that in an interrupted step-flow epitaxy on a vicinal surface, the decay of adatom monomer density on terraces after deposition often has a simple dependence on the monomer diffusion coefficient D, the step-edge sticking probability S, and the extra step-edge energy barrier Estep (Schwoebel-Ehrlich barrier). One may reliably determine these kinetics parameters by examining the dependence of the decay rate constant on the average terrace width and the temperature. Such a decay can be monitored by either reflection high-energy electron diffraction or optical reflectance difference techniques.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 10975-10980 |
| Number of pages | 6 |
| Journal | Physical Review B - Condensed Matter and Materials Physics |
| Volume | 58 |
| Issue number | 16 |
| State | Published - Oct 15 1998 |
ASJC Scopus subject areas
- Condensed Matter Physics
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Zhu, X. D. (1998). Reliable determination of kinetics parameters of adatoms in thin-film epitaxy. Physical Review B - Condensed Matter and Materials Physics, 58(16), 10975-10980.