A new dual-target dual-laser vaporization source for the production of binary metallic clusters is presented. Clusters of the type AunXm (X=Al, Fe, Co, Ni) were produced. Excellent control over the mixing process was achieved by varying the delay time between the firing of the two lasers and their energy densities. Having identified these critical parameters, their influence over the production process is shown in detail for the Aun,Alm system. The production of bimetallic clusters in this source is due to the spatial and temporal overlap of the two laser vaporized materials in the source.
|Original language||English (US)|
|Number of pages||5|
|Journal||Review of Scientific Instruments|
|State||Published - Jan 2000|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)