Abstract
Here we present facile microfabrication processes, referred to as print-to-pattern dry film photoresist (DFP) lithography, that utilize the combined advantages of wax printing and DFP to produce micropatterned substrates with high resolution over a large surface area in a non-cleanroom setting. The print-to-pattern methods can be performed in an out-of-cleanroom environment making microfabrication much more accessible to minimally equipped laboratories. Two different approaches employing either wax photomasks or wax etchmasks from a solid ink desktop printer have been demonstrated that allow the DFP to be processed in a negative tone or positive tone fashion, respectively, with resolutions of 100 m. The effect of wax melting on resolution and as a bonding material was also characterized. In addition, solid ink printers have the capacity to pattern large areas with high resolution, which was demonstrated by stacking DFP layers in a 50 mm × 50 mm woven pattern with 1 mm features. By using an office printer to generate the masking patterns, the mask designs can be easily altered in a graphic user interface to enable rapid prototyping.
Original language | English (US) |
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Article number | 057002 |
Journal | Journal of Micromechanics and Microengineering |
Volume | 24 |
Issue number | 5 |
DOIs | |
State | Published - Jan 1 2014 |
Keywords
- DIY
- dry film photoresist
- lithography
- rapid prototyping
- solid ink printing
ASJC Scopus subject areas
- Mechanics of Materials
- Electronic, Optical and Magnetic Materials
- Mechanical Engineering
- Electrical and Electronic Engineering