Abstract
A photolithography-free laser-patterned hydrofluoric acid-resistant chromium-polyimide tape masking method for rapid prototyping of microfluidic systems in glass is presented. The patterns are defined with a diode-pumped solid-state laser. Minimum feature size is limited to 30 µm; minimum spacing between features is limited to 40 µm. The patterned glass substrates are etched in 49% hydrofluoric acid at ambient temperature with soft agitation (up to 18 min). This method demonstrates comparable results to current more sophisticated masking methods in terms of the etched depth (up to 95 µm in borosilicate glass), feature undercut in isotropic etch (about 1.47), mask hole density (negligible, practically zero) as well as high yield and reliability.
Original language | English (US) |
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Title of host publication | 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 |
Editors | Mark G. Allen, Tina Lamers |
Publisher | Transducer Research Foundation |
Pages | 172-175 |
Number of pages | 4 |
ISBN (Electronic) | 9781940470023 |
DOIs | |
State | Published - Jan 1 2016 |
Event | 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 - Hilton Head, United States Duration: Jun 5 2016 → Jun 9 2016 |
Publication series
Name | 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 |
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Conference
Conference | 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 |
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Country | United States |
City | Hilton Head |
Period | 6/5/16 → 6/9/16 |
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering