@inproceedings{d9ba5eb2a43a43268c3903c30c4b4fa1,
title = "Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass",
abstract = "A photolithography-free laser-patterned hydrofluoric acid-resistant chromium-polyimide tape masking method for rapid prototyping of microfluidic systems in glass is presented. The patterns are defined with a diode-pumped solid-state laser. Minimum feature size is limited to 30 µm; minimum spacing between features is limited to 40 µm. The patterned glass substrates are etched in 49{\%} hydrofluoric acid at ambient temperature with soft agitation (up to 18 min). This method demonstrates comparable results to current more sophisticated masking methods in terms of the etched depth (up to 95 µm in borosilicate glass), feature undercut in isotropic etch (about 1.47), mask hole density (negligible, practically zero) as well as high yield and reliability.",
author = "Zamuruyev, {Konstantin O.} and Yuriy Zrodnikov and Davis, {Cristina E}",
year = "2016",
month = "1",
day = "1",
doi = "10.31438/trf.hh2016.48",
language = "English (US)",
series = "2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016",
publisher = "Transducer Research Foundation",
pages = "172--175",
editor = "Allen, {Mark G.} and Tina Lamers",
booktitle = "2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016",
note = "2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 ; Conference date: 05-06-2016 Through 09-06-2016",
}