Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass

Konstantin O. Zamuruyev, Yuriy Zrodnikov, Cristina E Davis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A photolithography-free laser-patterned hydrofluoric acid-resistant chromium-polyimide tape masking method for rapid prototyping of microfluidic systems in glass is presented. The patterns are defined with a diode-pumped solid-state laser. Minimum feature size is limited to 30 µm; minimum spacing between features is limited to 40 µm. The patterned glass substrates are etched in 49% hydrofluoric acid at ambient temperature with soft agitation (up to 18 min). This method demonstrates comparable results to current more sophisticated masking methods in terms of the etched depth (up to 95 µm in borosilicate glass), feature undercut in isotropic etch (about 1.47), mask hole density (negligible, practically zero) as well as high yield and reliability.

Original languageEnglish (US)
Title of host publication2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016
EditorsMark G. Allen, Tina Lamers
PublisherTransducer Research Foundation
Pages172-175
Number of pages4
ISBN (Electronic)9781940470023
DOIs
StatePublished - Jan 1 2016
Event2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 - Hilton Head, United States
Duration: Jun 5 2016Jun 9 2016

Publication series

Name2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016

Conference

Conference2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016
CountryUnited States
CityHilton Head
Period6/5/166/9/16

Fingerprint

Hydrofluoric acid
Photolithography
Microfluidics
Polyimides
Masks
Chromium
Fabrication
Glass
Borosilicate glass
Acids
Lasers
Solid state lasers
Rapid prototyping
Tapes
Diodes
Substrates
Temperature

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Zamuruyev, K. O., Zrodnikov, Y., & Davis, C. E. (2016). Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass. In M. G. Allen, & T. Lamers (Eds.), 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016 (pp. 172-175). (2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016). Transducer Research Foundation. https://doi.org/10.31438/trf.hh2016.48

Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass. / Zamuruyev, Konstantin O.; Zrodnikov, Yuriy; Davis, Cristina E.

2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016. ed. / Mark G. Allen; Tina Lamers. Transducer Research Foundation, 2016. p. 172-175 (2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zamuruyev, KO, Zrodnikov, Y & Davis, CE 2016, Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass. in MG Allen & T Lamers (eds), 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016. 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016, Transducer Research Foundation, pp. 172-175, 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016, Hilton Head, United States, 6/5/16. https://doi.org/10.31438/trf.hh2016.48
Zamuruyev KO, Zrodnikov Y, Davis CE. Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass. In Allen MG, Lamers T, editors, 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016. Transducer Research Foundation. 2016. p. 172-175. (2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016). https://doi.org/10.31438/trf.hh2016.48
Zamuruyev, Konstantin O. ; Zrodnikov, Yuriy ; Davis, Cristina E. / Photolithography-free laser-patterned Hf acid-resistant chromium-polyimide mask for rapid fabrication of microfluidic systems in glass. 2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016. editor / Mark G. Allen ; Tina Lamers. Transducer Research Foundation, 2016. pp. 172-175 (2016 Solid-State Sensors, Actuators and Microsystems Workshop, Hilton Head 2016).
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