Photochemical pattern transfer and enhancement of thin film silica mesophases

Andrew M. Dattelbaum, Meri L. Amweg, Laurel E. Ecke, Chanel K. Yee, Andrew P. Shreve, Atul N. Parikh

Research output: Contribution to journalArticlepeer-review

43 Scopus citations

Abstract

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.

Original languageEnglish (US)
Pages (from-to)719-722
Number of pages4
JournalNano Letters
Volume3
Issue number6
DOIs
StatePublished - Jun 1 2003

ASJC Scopus subject areas

  • Materials Science(all)

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