Photochemical pattern transfer and enhancement of thin film silica mesophases

Andrew M. Dattelbaum, Meri L. Amweg, Laurel E. Ecke, Chanel K. Yee, Andrew P. Shreve, Atul N. Parikh

Research output: Contribution to journalArticle

41 Citations (Scopus)

Abstract

Here we present a spatially directed calcination approach based on masked UV exposure to pattern mesoporous regions within a mesostructured matrix in a rapid, single-step, and inexpensive manner. Subsequent chemical treatment of the film can selectively remove the mesostructured regions, leading to patterned mesoporous structures. Such tunability in the processing under near room-temperature conditions allows for spatial control and patterning of function related to optical properties, topology, porosity, hydrophobicity, and structural morphology of the mesoscopic thin film material on a wide range of substrates.

Original languageEnglish (US)
Pages (from-to)719-722
Number of pages4
JournalNano Letters
Volume3
Issue number6
DOIs
StatePublished - Jun 1 2003

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Hydrophobicity
hydrophobicity
Silicon Dioxide
Calcination
roasting
topology
Optical properties
Porosity
Silica
Topology
silicon dioxide
porosity
optical properties
Thin films
augmentation
room temperature
Substrates
matrices
thin films
Processing

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Dattelbaum, A. M., Amweg, M. L., Ecke, L. E., Yee, C. K., Shreve, A. P., & Parikh, A. N. (2003). Photochemical pattern transfer and enhancement of thin film silica mesophases. Nano Letters, 3(6), 719-722. https://doi.org/10.1021/nl0341279

Photochemical pattern transfer and enhancement of thin film silica mesophases. / Dattelbaum, Andrew M.; Amweg, Meri L.; Ecke, Laurel E.; Yee, Chanel K.; Shreve, Andrew P.; Parikh, Atul N.

In: Nano Letters, Vol. 3, No. 6, 01.06.2003, p. 719-722.

Research output: Contribution to journalArticle

Dattelbaum, AM, Amweg, ML, Ecke, LE, Yee, CK, Shreve, AP & Parikh, AN 2003, 'Photochemical pattern transfer and enhancement of thin film silica mesophases', Nano Letters, vol. 3, no. 6, pp. 719-722. https://doi.org/10.1021/nl0341279
Dattelbaum AM, Amweg ML, Ecke LE, Yee CK, Shreve AP, Parikh AN. Photochemical pattern transfer and enhancement of thin film silica mesophases. Nano Letters. 2003 Jun 1;3(6):719-722. https://doi.org/10.1021/nl0341279
Dattelbaum, Andrew M. ; Amweg, Meri L. ; Ecke, Laurel E. ; Yee, Chanel K. ; Shreve, Andrew P. ; Parikh, Atul N. / Photochemical pattern transfer and enhancement of thin film silica mesophases. In: Nano Letters. 2003 ; Vol. 3, No. 6. pp. 719-722.
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