Personal fluoride and solvent exposures, and their determinants, in semiconductor manufacturing

Susan R. Woskie, S. Katharine Hammond, Cynthia J. Hines, Marilyn F. Hallock, Elaina Kenyon, Marc B Schenker

Research output: Contribution to journalArticle

6 Scopus citations


Personal air sampling for fluorides and solvents was done at 35 semiconductor fabrication facilities in the United States. Fluoride compounds were used in etching and cleaning operations, and solvents were used in photoresist and developing operations. All personal solvent and fluoride levels were less than 2 percent of current Occupational Safety and Health Administration (OSHA) standards. Statistical models of the exposure determinants for the target agents found production level, as indicated by number of semiconductor wafer cassettes loaded/unloaded from the target machines or baths, was predictive of fluoride, xylene and 1-methoxy-2-propyl acetate exposures. The percent of fresh air ventilation and the percent of xylene in the photoresist were also significant determinants in the statistical model predicting personal xylene exposure levels.

Original languageEnglish (US)
Pages (from-to)354-361
Number of pages8
JournalApplied Occupational and Environmental Hygiene
Issue number4
StatePublished - Apr 2000


  • Chemical Exposures
  • Exposure Assessment
  • Exposure Determinants
  • Fluoride
  • Glycol Ethers
  • Semiconductor Manufacturing
  • Solvents

ASJC Scopus subject areas

  • Public Health, Environmental and Occupational Health

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