Pb electrodeposltion in the presence of chlorine Ions on Cu(100): An in situ optical reflectivity difference study

J. Gray, W. Schwarzacher, X. D. Zhu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We studied the initial stages of the electrodeposition of Pb in the presence of chlorine ions on Cu(100), using an oblique-incidence optical reflectivity difference (OI-RD) technique. The OI-RD results reveal that immediately following the underpotential deposition (UPD) of the first Pb monolayer, two different types of bulk-phase films grow depending upon the magnitude of overpotential and cyclic voltammetry (CV) scan rate. At low overpotentials and/or slow scan rates, we propose that a bulk-phase Pb film grows on top of the UPD monolayer. At high overpotentials and/or fast scan rates, either a PbO, PbCl2, or a rough Pb bulk-phase layer grows on top of the UPD layer such that the reflectivity difference signal from such a film has an opposite sign.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
Pages88-93
Number of pages6
Volume781
StatePublished - 2003
Event2003 MRS Spring Meeting - San Francisco, CA, United States
Duration: Apr 21 2003Apr 25 2003

Other

Other2003 MRS Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period4/21/034/25/03

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Pb electrodeposltion in the presence of chlorine Ions on Cu(100): An in situ optical reflectivity difference study'. Together they form a unique fingerprint.

Cite this