Pb electrodeposition on polycrystalline Cu in the presence and absence of Cl-: A combined oblique incidence reflectivity difference and in situ AFM study

Guang Yu Wu, S. E. Bae, A. A. Gewirth, J. Gray, X. D. Zhu, T. P. Moffat, W. Schwarzacher

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

Oblique incidence reflectivity difference (OI-RD) measurements reveal differences in the earliest stages of overpotential-deposited (OPD) growth between Pb electrodeposition on polycrystalline Cu surfaces in the presence and absence of Cl-. At moderate overpotentials, when only 100 mM ClO4 - is present, the magnitude of the real part of the OI-RD signal continues to increase after completion of the first underpotential-deposited (UPD) Pb monolayer, but with the addition of 20 mM KCl the magnitude decreases after the UPD monolayer forms. In situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of Cl-, the UPD Pb monolayer dissolves after the Pb islands disappear.

Original languageEnglish (US)
Pages (from-to)1886-1891
Number of pages6
JournalSurface Science
Volume601
Issue number8
DOIs
StatePublished - Apr 15 2007

Fingerprint

Electrodeposition
electrodeposition
Monolayers
Atomic force microscopy
incidence
atomic force microscopy
reflectance
probes
Substrates

Keywords

  • Atomic force microscopy
  • Copper
  • Electrochemical methods
  • Electrochemical phenomena
  • Ellipsometry
  • Lead
  • Nucleation

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Pb electrodeposition on polycrystalline Cu in the presence and absence of Cl- : A combined oblique incidence reflectivity difference and in situ AFM study. / Wu, Guang Yu; Bae, S. E.; Gewirth, A. A.; Gray, J.; Zhu, X. D.; Moffat, T. P.; Schwarzacher, W.

In: Surface Science, Vol. 601, No. 8, 15.04.2007, p. 1886-1891.

Research output: Contribution to journalArticle

Wu, Guang Yu ; Bae, S. E. ; Gewirth, A. A. ; Gray, J. ; Zhu, X. D. ; Moffat, T. P. ; Schwarzacher, W. / Pb electrodeposition on polycrystalline Cu in the presence and absence of Cl- : A combined oblique incidence reflectivity difference and in situ AFM study. In: Surface Science. 2007 ; Vol. 601, No. 8. pp. 1886-1891.
@article{c20829438c6c4d20973e79df5c33e1f8,
title = "Pb electrodeposition on polycrystalline Cu in the presence and absence of Cl-: A combined oblique incidence reflectivity difference and in situ AFM study",
abstract = "Oblique incidence reflectivity difference (OI-RD) measurements reveal differences in the earliest stages of overpotential-deposited (OPD) growth between Pb electrodeposition on polycrystalline Cu surfaces in the presence and absence of Cl-. At moderate overpotentials, when only 100 mM ClO4 - is present, the magnitude of the real part of the OI-RD signal continues to increase after completion of the first underpotential-deposited (UPD) Pb monolayer, but with the addition of 20 mM KCl the magnitude decreases after the UPD monolayer forms. In situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of Cl-, the UPD Pb monolayer dissolves after the Pb islands disappear.",
keywords = "Atomic force microscopy, Copper, Electrochemical methods, Electrochemical phenomena, Ellipsometry, Lead, Nucleation",
author = "Wu, {Guang Yu} and Bae, {S. E.} and Gewirth, {A. A.} and J. Gray and Zhu, {X. D.} and Moffat, {T. P.} and W. Schwarzacher",
year = "2007",
month = "4",
day = "15",
doi = "10.1016/j.susc.2007.02.016",
language = "English (US)",
volume = "601",
pages = "1886--1891",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier",
number = "8",

}

TY - JOUR

T1 - Pb electrodeposition on polycrystalline Cu in the presence and absence of Cl-

T2 - A combined oblique incidence reflectivity difference and in situ AFM study

AU - Wu, Guang Yu

AU - Bae, S. E.

AU - Gewirth, A. A.

AU - Gray, J.

AU - Zhu, X. D.

AU - Moffat, T. P.

AU - Schwarzacher, W.

PY - 2007/4/15

Y1 - 2007/4/15

N2 - Oblique incidence reflectivity difference (OI-RD) measurements reveal differences in the earliest stages of overpotential-deposited (OPD) growth between Pb electrodeposition on polycrystalline Cu surfaces in the presence and absence of Cl-. At moderate overpotentials, when only 100 mM ClO4 - is present, the magnitude of the real part of the OI-RD signal continues to increase after completion of the first underpotential-deposited (UPD) Pb monolayer, but with the addition of 20 mM KCl the magnitude decreases after the UPD monolayer forms. In situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of Cl-, the UPD Pb monolayer dissolves after the Pb islands disappear.

AB - Oblique incidence reflectivity difference (OI-RD) measurements reveal differences in the earliest stages of overpotential-deposited (OPD) growth between Pb electrodeposition on polycrystalline Cu surfaces in the presence and absence of Cl-. At moderate overpotentials, when only 100 mM ClO4 - is present, the magnitude of the real part of the OI-RD signal continues to increase after completion of the first underpotential-deposited (UPD) Pb monolayer, but with the addition of 20 mM KCl the magnitude decreases after the UPD monolayer forms. In situ atomic force microscopy (AFM) shows that in the former case the island density is much greater than in the latter. Using OI-RD as a probe, we show additionally that when the substrate potential is returned to a more positive potential in the presence of Cl-, the UPD Pb monolayer dissolves after the Pb islands disappear.

KW - Atomic force microscopy

KW - Copper

KW - Electrochemical methods

KW - Electrochemical phenomena

KW - Ellipsometry

KW - Lead

KW - Nucleation

UR - http://www.scopus.com/inward/record.url?scp=34047266643&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34047266643&partnerID=8YFLogxK

U2 - 10.1016/j.susc.2007.02.016

DO - 10.1016/j.susc.2007.02.016

M3 - Article

AN - SCOPUS:34047266643

VL - 601

SP - 1886

EP - 1891

JO - Surface Science

JF - Surface Science

SN - 0039-6028

IS - 8

ER -