Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species

Babak Sanii, Atui N. Parikh

Research output: Chapter in Book/Report/Conference proceedingChapter

9 Citations (Scopus)

Abstract

Patterning physical, chemical, and biological functions at solid surfaces combines technological development with scientific discoveries in many disparate fields. A variety of top-down and bottom-up approaches has proved successful for applications in the solid state, affording large-area patterning at ever-shrinking length scales. Here we review a collection of recent efforts that highlight the versatility of short-wavelength ultraviolet light and photogenerated reactive oxygen species as a simple and cost-effective means to pattern a variety of challenging materials and thin-film configurations. In particular, we discuss two different classes of materials that present different challenges for patterning: fluid phospholipid bilayers at the buried solid-water interface and the surfaces of bulk elastomers. Despite the use of an identical patterning source, the generation and stabilization of patterns in these two classes of materials follow different mechanisms and produce different functionalities.

Original languageEnglish (US)
Title of host publicationAnnual Review of Physical Chemistry
Pages411-432
Number of pages22
Volume59
DOIs
StatePublished - 2008

Publication series

NameAnnual Review of Physical Chemistry
Volume59
ISSN (Print)0066426X

Fingerprint

Ultraviolet radiation
Reactive Oxygen Species
Wavelength
Fluids
fluids
oxygen
elastomers
radiation
versatility
wavelengths
solid surfaces
ultraviolet radiation
Elastomers
stabilization
solid state
costs
Phospholipids
thin films
Stabilization
configurations

Keywords

  • Curvature
  • Supported lipid membrane
  • Wet lithography
  • Wrinkle

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

Cite this

Sanii, B., & Parikh, A. N. (2008). Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species. In Annual Review of Physical Chemistry (Vol. 59, pp. 411-432). (Annual Review of Physical Chemistry; Vol. 59). https://doi.org/10.1146/annurev.physchem.58.032806.104644

Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species. / Sanii, Babak; Parikh, Atui N.

Annual Review of Physical Chemistry. Vol. 59 2008. p. 411-432 (Annual Review of Physical Chemistry; Vol. 59).

Research output: Chapter in Book/Report/Conference proceedingChapter

Sanii, B & Parikh, AN 2008, Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species. in Annual Review of Physical Chemistry. vol. 59, Annual Review of Physical Chemistry, vol. 59, pp. 411-432. https://doi.org/10.1146/annurev.physchem.58.032806.104644
Sanii B, Parikh AN. Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species. In Annual Review of Physical Chemistry. Vol. 59. 2008. p. 411-432. (Annual Review of Physical Chemistry). https://doi.org/10.1146/annurev.physchem.58.032806.104644
Sanii, Babak ; Parikh, Atui N. / Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species. Annual Review of Physical Chemistry. Vol. 59 2008. pp. 411-432 (Annual Review of Physical Chemistry).
@inbook{5a3889a3271941f89a41de06a312d5b6,
title = "Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species",
abstract = "Patterning physical, chemical, and biological functions at solid surfaces combines technological development with scientific discoveries in many disparate fields. A variety of top-down and bottom-up approaches has proved successful for applications in the solid state, affording large-area patterning at ever-shrinking length scales. Here we review a collection of recent efforts that highlight the versatility of short-wavelength ultraviolet light and photogenerated reactive oxygen species as a simple and cost-effective means to pattern a variety of challenging materials and thin-film configurations. In particular, we discuss two different classes of materials that present different challenges for patterning: fluid phospholipid bilayers at the buried solid-water interface and the surfaces of bulk elastomers. Despite the use of an identical patterning source, the generation and stabilization of patterns in these two classes of materials follow different mechanisms and produce different functionalities.",
keywords = "Curvature, Supported lipid membrane, Wet lithography, Wrinkle",
author = "Babak Sanii and Parikh, {Atui N.}",
year = "2008",
doi = "10.1146/annurev.physchem.58.032806.104644",
language = "English (US)",
isbn = "9780824310592",
volume = "59",
series = "Annual Review of Physical Chemistry",
pages = "411--432",
booktitle = "Annual Review of Physical Chemistry",

}

TY - CHAP

T1 - Patterning fluid and elastomeric surfaces using short-wavelength UV radiation and photogenerated reactive oxygen species

AU - Sanii, Babak

AU - Parikh, Atui N.

PY - 2008

Y1 - 2008

N2 - Patterning physical, chemical, and biological functions at solid surfaces combines technological development with scientific discoveries in many disparate fields. A variety of top-down and bottom-up approaches has proved successful for applications in the solid state, affording large-area patterning at ever-shrinking length scales. Here we review a collection of recent efforts that highlight the versatility of short-wavelength ultraviolet light and photogenerated reactive oxygen species as a simple and cost-effective means to pattern a variety of challenging materials and thin-film configurations. In particular, we discuss two different classes of materials that present different challenges for patterning: fluid phospholipid bilayers at the buried solid-water interface and the surfaces of bulk elastomers. Despite the use of an identical patterning source, the generation and stabilization of patterns in these two classes of materials follow different mechanisms and produce different functionalities.

AB - Patterning physical, chemical, and biological functions at solid surfaces combines technological development with scientific discoveries in many disparate fields. A variety of top-down and bottom-up approaches has proved successful for applications in the solid state, affording large-area patterning at ever-shrinking length scales. Here we review a collection of recent efforts that highlight the versatility of short-wavelength ultraviolet light and photogenerated reactive oxygen species as a simple and cost-effective means to pattern a variety of challenging materials and thin-film configurations. In particular, we discuss two different classes of materials that present different challenges for patterning: fluid phospholipid bilayers at the buried solid-water interface and the surfaces of bulk elastomers. Despite the use of an identical patterning source, the generation and stabilization of patterns in these two classes of materials follow different mechanisms and produce different functionalities.

KW - Curvature

KW - Supported lipid membrane

KW - Wet lithography

KW - Wrinkle

UR - http://www.scopus.com/inward/record.url?scp=43949128756&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=43949128756&partnerID=8YFLogxK

U2 - 10.1146/annurev.physchem.58.032806.104644

DO - 10.1146/annurev.physchem.58.032806.104644

M3 - Chapter

C2 - 18031214

AN - SCOPUS:43949128756

SN - 9780824310592

VL - 59

T3 - Annual Review of Physical Chemistry

SP - 411

EP - 432

BT - Annual Review of Physical Chemistry

ER -