Oxidation kinetics in SrTiO 3 homoepitaxy

X. D. Zhu, W. Si, X. X. Xi, Q. Jiang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Using an oblique-incidence optical reflectivity difference technique, we investigated kinetic processes in SrTiO 3 homoepitaxy on SrTiO 3(001) under pulsed laser deposition conditions. Depending upon growth temperature and oxygen ambient pressure, we found that the oxidation of an as-grown SrTiO 3 monolayer may take a much longer time to complete than the recrystallization of the monolayer. The oxidation reaction was found to be characterized by an effective activation energy barrier of 1.35 eV and a large pre-exponential factor.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsM. Yaedon, S. Chiang, R.F.C. Farrow, J.W. Evans, O. Auciello
Pages115-121
Number of pages7
Volume619
StatePublished - 2000
EventRecent Developments in Oxide and Metal Epitaxy -Theory and Experiment - San Francisco, CA, United States
Duration: Apr 23 2000Apr 26 2000

Other

OtherRecent Developments in Oxide and Metal Epitaxy -Theory and Experiment
CountryUnited States
CitySan Francisco, CA
Period4/23/004/26/00

Fingerprint

Monolayers
Oxidation
Kinetics
Energy barriers
Growth temperature
Pulsed laser deposition
Activation energy
Crystallization
Oxygen

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Zhu, X. D., Si, W., Xi, X. X., & Jiang, Q. (2000). Oxidation kinetics in SrTiO 3 homoepitaxy In M. Yaedon, S. Chiang, R. F. C. Farrow, J. W. Evans, & O. Auciello (Eds.), Materials Research Society Symposium - Proceedings (Vol. 619, pp. 115-121)

Oxidation kinetics in SrTiO 3 homoepitaxy . / Zhu, X. D.; Si, W.; Xi, X. X.; Jiang, Q.

Materials Research Society Symposium - Proceedings. ed. / M. Yaedon; S. Chiang; R.F.C. Farrow; J.W. Evans; O. Auciello. Vol. 619 2000. p. 115-121.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhu, XD, Si, W, Xi, XX & Jiang, Q 2000, Oxidation kinetics in SrTiO 3 homoepitaxy in M Yaedon, S Chiang, RFC Farrow, JW Evans & O Auciello (eds), Materials Research Society Symposium - Proceedings. vol. 619, pp. 115-121, Recent Developments in Oxide and Metal Epitaxy -Theory and Experiment, San Francisco, CA, United States, 4/23/00.
Zhu XD, Si W, Xi XX, Jiang Q. Oxidation kinetics in SrTiO 3 homoepitaxy In Yaedon M, Chiang S, Farrow RFC, Evans JW, Auciello O, editors, Materials Research Society Symposium - Proceedings. Vol. 619. 2000. p. 115-121
Zhu, X. D. ; Si, W. ; Xi, X. X. ; Jiang, Q. / Oxidation kinetics in SrTiO 3 homoepitaxy Materials Research Society Symposium - Proceedings. editor / M. Yaedon ; S. Chiang ; R.F.C. Farrow ; J.W. Evans ; O. Auciello. Vol. 619 2000. pp. 115-121
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