The oblique-incidence optical reflectance difference technique is developed for monitoring in real time the kinetics of thin film epitaxy under high ambient pressure. In the case of La0.67Ba0.33MnO3-δ (LMBO) epitaxy on SrTiO3 (STO) (001), the study shows both qualitatively and quantitatively that the oxidation reaction is the rate-limiting step of the growth under the commonly used pulsed-laser deposition conditions. The kinetics parameters obtained are important for devising the growth strategy to make full oxygenated LBMO epitaxial films.
|Original language||English (US)|
|Number of pages||3|
|Journal||Applied Physics Letters|
|State||Published - Jun 7 1999|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)