Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

P. Celliers; L. B. Da Silva; C. B. Dane; S. Mrowka; M. Norton; J. Harder; L. Hackel; Dennis L Matthews; H. Fiedorowicz; A. Bartnik; J. R. Maldonado; J. A. Abate

Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

P. Celliers, L. B. Da Silva, C. B. Dane, S. Mrowka, M. Norton, J. Harder, L. Hackel, Dennis L Matthews, H. Fiedorowicz, A. Bartnik, J. R. Maldonado, J. A. Abate

Research output: Contribution to journal › Article › peer-review

32 Scopus citations

Abstract

We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 Å wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.

Original language	English (US)
Pages (from-to)	8258-8268
Number of pages	11
Journal	Journal of Applied Physics
Volume	79
Issue number	11
State	Published - Jun 1 1996
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)
Physics and Astronomy (miscellaneous)

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Optimization of x-ray sources for proximity lithography produced by a high average power Nd : glass laser. / Celliers, P.; Da Silva, L. B.; Dane, C. B.; Mrowka, S.; Norton, M.; Harder, J.; Hackel, L.; Matthews, Dennis L; Fiedorowicz, H.; Bartnik, A.; Maldonado, J. R.; Abate, J. A.

In: Journal of Applied Physics, Vol. 79, No. 11, 01.06.1996, p. 8258-8268.

Research output: Contribution to journal › Article › peer-review

@article{3dc7d39fab2447ea8055a228214dc4ec,

title = "Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser",

abstract = "We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 {\AA} wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.",

author = "P. Celliers and {Da Silva}, {L. B.} and Dane, {C. B.} and S. Mrowka and M. Norton and J. Harder and L. Hackel and Matthews, {Dennis L} and H. Fiedorowicz and A. Bartnik and Maldonado, {J. R.} and Abate, {J. A.}",

year = "1996",

month = jun,

day = "1",

language = "English (US)",

volume = "79",

pages = "8258--8268",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "11",

}

TY - JOUR

T1 - Optimization of x-ray sources for proximity lithography produced by a high average power Nd

T2 - glass laser

AU - Celliers, P.

AU - Da Silva, L. B.

AU - Dane, C. B.

AU - Mrowka, S.

AU - Norton, M.

AU - Harder, J.

AU - Hackel, L.

AU - Matthews, Dennis L

AU - Fiedorowicz, H.

AU - Bartnik, A.

AU - Maldonado, J. R.

AU - Abate, J. A.

PY - 1996/6/1

Y1 - 1996/6/1

N2 - We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 Å wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.

AB - We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 Å wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.

UR - http://www.scopus.com/inward/record.url?scp=0000499628&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000499628&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0000499628

VL - 79

SP - 8258

EP - 8268

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 11

ER -

Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

Abstract

ASJC Scopus subject areas

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