Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

P. Celliers, L. B. Da Silva, C. B. Dane, S. Mrowka, M. Norton, J. Harder, L. Hackel, Dennis L Matthews, H. Fiedorowicz, A. Bartnik, J. R. Maldonado, J. A. Abate

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Abstract

We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 Å wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.

Original languageEnglish (US)
Pages (from-to)8258-8268
Number of pages11
JournalJournal of Applied Physics
Volume79
Issue number11
StatePublished - Jun 1 1996
Externally publishedYes

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ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Celliers, P., Da Silva, L. B., Dane, C. B., Mrowka, S., Norton, M., Harder, J., Hackel, L., Matthews, D. L., Fiedorowicz, H., Bartnik, A., Maldonado, J. R., & Abate, J. A. (1996). Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser. Journal of Applied Physics, 79(11), 8258-8268.