Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

P. Celliers; L. B. Da Silva; C. B. Dane; S. Mrowka; M. Norton; J. Harder; L. Hackel; Dennis L Matthews; H. Fiedorowicz; A. Bartnik; J. R. Maldonado; J. A. Abate

Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser

P. Celliers, L. B. Da Silva, C. B. Dane, S. Mrowka, M. Norton, J. Harder, L. Hackel, Dennis L Matthews, H. Fiedorowicz, A. Bartnik, J. R. Maldonado, J. A. Abate

Research output: Contribution to journal › Article

31 Scopus citations

Abstract

We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 Å wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.

Original language	English (US)
Pages (from-to)	8258-8268
Number of pages	11
Journal	Journal of Applied Physics
Volume	79
Issue number	11
State	Published - Jun 1 1996
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)
Physics and Astronomy (miscellaneous)

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Celliers, P., Da Silva, L. B., Dane, C. B., Mrowka, S., Norton, M., Harder, J., Hackel, L., Matthews, D. L., Fiedorowicz, H., Bartnik, A., Maldonado, J. R., & Abate, J. A. (1996). Optimization of x-ray sources for proximity lithography produced by a high average power Nd: glass laser. Journal of Applied Physics, 79(11), 8258-8268.

Optimization of x-ray sources for proximity lithography produced by a high average power Nd : glass laser. / Celliers, P.; Da Silva, L. B.; Dane, C. B.; Mrowka, S.; Norton, M.; Harder, J.; Hackel, L.; Matthews, Dennis L; Fiedorowicz, H.; Bartnik, A.; Maldonado, J. R.; Abate, J. A.

In: Journal of Applied Physics, Vol. 79, No. 11, 01.06.1996, p. 8258-8268.

Research output: Contribution to journal › Article

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abstract = "We measured the conversion efficiency of laser pulse energy into keV x rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns full width at half-maximum pulses at up to 20 J at 1.053 μm and 12 J at 0.53 μm. Targets were chosen to optimize emission in the 10-15 {\AA} wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z = 54) With 1.053 μm a maximum conversion of 11% into 2π sr was measured from solid Xe targets At 0.527 μm, ;efficiencies of 12%-18%/(2π sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2π sr) when irradiated with 1.053 μm.",

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AU - Norton, M.

AU - Harder, J.

AU - Hackel, L.

AU - Matthews, Dennis L

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AU - Bartnik, A.

AU - Maldonado, J. R.

AU - Abate, J. A.

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