Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110)

P. Thomas, E. Nabighian, M. C. Bartelt, C. Y. Fong, X. D. Zhu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We studied adsorption, growth and desorption of Xe on Nb(110) using an in-situ oblique-incidence reflectivity difference (OI-RD) technique and low energy electron diffraction (LEED) from 32 K to 100 K. The results show that Xe grows a (111)-oriented film after a transition layer is formed on Nb(110). The transition layer consists of three layers. The first two layers are disordered with Xe-Xe separation significantly larger than the bulk value. The third monolayer forms a close packed (111) structure on top of the tensile-strained double layer and serves as a template for subsequent homoepitaxy. The adsorption of the first and the second layers are zeroth order with sticking coefficient close to one. Growth of the Xe(111) film on the transition layer proceeds in a step flow mode from 54K to 40K. At 40K, an incomplete layer-by-layer growth is observed while below 35K the growth proceeds in a multilayer mode.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsD.B. Chrisey, M. Dinescu, I.W. Boyd, A.V. Rode
Pages117-122
Number of pages6
Volume780
StatePublished - 2003
EventMATERIALS RESEARCH SOCIETY SYMPOSIUM - PROCEEDINGS: Advanced Optical Processing of Materials - San Francisco, CA, United States
Duration: Apr 22 2003Apr 23 2003

Other

OtherMATERIALS RESEARCH SOCIETY SYMPOSIUM - PROCEEDINGS: Advanced Optical Processing of Materials
CountryUnited States
CitySan Francisco, CA
Period4/22/034/23/03

Fingerprint

Low energy electron diffraction
Adsorption
Monolayers
Desorption
Multilayers

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Thomas, P., Nabighian, E., Bartelt, M. C., Fong, C. Y., & Zhu, X. D. (2003). Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110). In D. B. Chrisey, M. Dinescu, I. W. Boyd, & A. V. Rode (Eds.), Materials Research Society Symposium - Proceedings (Vol. 780, pp. 117-122)

Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110). / Thomas, P.; Nabighian, E.; Bartelt, M. C.; Fong, C. Y.; Zhu, X. D.

Materials Research Society Symposium - Proceedings. ed. / D.B. Chrisey; M. Dinescu; I.W. Boyd; A.V. Rode. Vol. 780 2003. p. 117-122.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Thomas, P, Nabighian, E, Bartelt, MC, Fong, CY & Zhu, XD 2003, Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110). in DB Chrisey, M Dinescu, IW Boyd & AV Rode (eds), Materials Research Society Symposium - Proceedings. vol. 780, pp. 117-122, MATERIALS RESEARCH SOCIETY SYMPOSIUM - PROCEEDINGS: Advanced Optical Processing of Materials, San Francisco, CA, United States, 4/22/03.
Thomas P, Nabighian E, Bartelt MC, Fong CY, Zhu XD. Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110). In Chrisey DB, Dinescu M, Boyd IW, Rode AV, editors, Materials Research Society Symposium - Proceedings. Vol. 780. 2003. p. 117-122
Thomas, P. ; Nabighian, E. ; Bartelt, M. C. ; Fong, C. Y. ; Zhu, X. D. / Oblique-incidence reflectivity difference (OI-RD) and LEED studies of adsorption and growth of Xe on Nb(110). Materials Research Society Symposium - Proceedings. editor / D.B. Chrisey ; M. Dinescu ; I.W. Boyd ; A.V. Rode. Vol. 780 2003. pp. 117-122
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