Two fabrication techniques, nanoshaving and nanografting, have been developed to produce nanopatterns of self-assembled monolayers. Nanoshaving creates negative nanofeatures by displacing self-assembled adsorbates using an atomic force microscopy tip under high imaging forces. Both positive and negative patterns can be produced via nanografting, which is a new method recently developed by our research group. Nanografting combines adsorbate displacement and self-assembly of alkanethiols on gold. This chapter discusses potential applications and important technical issues involved in both methods such as the determination of the optimal fabrication forces, and the influence of the environment on the precision of nanofeatures. Compared with other microfabrication methods, these two techniques allow more precise control of size and geometry. Resolution better than 1 nm can be routinely obtained. In nanografting, multiple component features are fabricated and nanostructures can be quickly changed, modified, and characterized in situ. These advantages make both methods very useful for the fabrication and characterization of prototypical nanoelectronic devices.
|Original language||English (US)|
|Number of pages||10|
|Journal||ACS Symposium Series|
|State||Published - 1999|
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