Monitoring annealing via CO2 laser heating of defect populations on fused silica surfaces using photoluminescence microscopy

Rajesh N. Raman, Manyalibo J. Matthews, John J. Adams, Stavros G. Demos

Research output: Contribution to journalArticle

27 Scopus citations

Abstract

Photoluminescence (PL) microscopy and spectroscopy under 266 nm and 355 nm laser excitation are explored as a means of monitoring defect populations in laser-modified sites on the surface of fused silica and their subsequent response to heating to different temperatures via exposure to a CO2 laser beam. Laser-induced temperature changes were estimated using an analytic solution to the heat flow equation and compared to changes in the PL emission intensity. The results indicate that the defect concentrations decrease significantly with increasing CO2 laser exposure and are nearly eliminated when the peak surface temperature exceeds the softening point of fused silica (∼1900K), suggesting that this method might be suitable for in situ monitoring of repair of defective sites in fused silica optical components.

Original languageEnglish (US)
Pages (from-to)15207-15215
Number of pages9
JournalOptics Express
Volume18
Issue number14
DOIs
StatePublished - Jul 5 2010
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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