Modulation of osteogenic differentiation in hMSCs cells by submicron topographically-patterned ridges and grooves

Shinya Watari, Kei Hayashi, Joshua Wood, Paul Russell, Paul F. Nealey, Christopher J Murphy, Damian C Genetos

Research output: Contribution to journalArticle

139 Scopus citations

Abstract

Recent studies have shown that nanoscale and submicron topographic cues modulate a menu of fundamental cell behaviors, and the use of topographic cues is an expanding area of study in tissue engineering. We used topographically-patterned substrates containing anisotropically ordered ridges and grooves to investigate the effects of topographic cues on mesenchymal stem cell morphology, proliferation, and osteogenic differentiation. We found that human mesenchymal stem cells cultured on 1400 or 4000. nm pitches showed greater elongation and alignment relative to 400. nm pitch or planar control. Cells cultured on 400. nm pitch demonstrated significant increases in RUNX2 and BGLAP expression relative to cells cultured on 1400 or 4000. nm pitch or planar control. Four-hundred nanometer pitch enhanced extracellular calcium deposition. Cells cultured in osteoinductive medium revealed combinatory effects of topography and chemical cues on 400. nm pitch as well as up-regulation of expression of ID1, a target of the BMP pathway. Our data demonstrate that a specific size scale of topographic cue promotes osteogenic differentiation with or without osteogenic agents. These data demonstrate that the integration of topographic cues may be useful for the fabrication of orthopedic implants.

Original languageEnglish (US)
Pages (from-to)128-136
Number of pages9
JournalBiomaterials
Volume33
Issue number1
DOIs
StatePublished - Jan 2012

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Keywords

  • Bone Morphogenetic Protein (BMP)
  • Mesenchymal stem cells
  • Nanotopographic ridges and grooves
  • Osteogenic differentiation
  • Osteoinductive agents

ASJC Scopus subject areas

  • Biomaterials
  • Bioengineering
  • Ceramics and Composites
  • Mechanics of Materials
  • Biophysics

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