Modification of the fused silica glass network associated with waveguide fabrication using femtosecond laser pulses

James W Chan, Thomas R Huser, S. H. Risbud, D. M. Krol

Research output: Contribution to journalArticle

177 Citations (Scopus)

Abstract

Atomic-scale structural changes have been observed in the glass network of fused silica after modification by tightly focused 800-nm, 130-fs laser pulses at fluences between 5 and 200 J cm-2. Raman spectroscopy of the modified glass shows an increase in the 490 and 605-cm-1 peaks, indicating an increase in the number of 4- and 3-membered ring structures in the silica network. These results provide evidence that densification of the glass occurs after exposure to fs pulses. Fluorescence spectroscopy of the modified glass shows a broad fluorescence band at 630 nm, indicating the formation of non-bridging oxygen hole centers (NBOHC) by fs pulses. Waveguides that support the fundamental mode at 633 nm have been fabricated inside fused silica by scanning the glass along the fs laser beam axis. The index changes are estimated to be approximately 0.07 × 10-3.

Original languageEnglish (US)
Pages (from-to)367-372
Number of pages6
JournalApplied Physics A: Materials Science and Processing
Volume76
Issue number3
DOIs
StatePublished - Mar 2003

Fingerprint

silica glass
Fused silica
Ultrashort pulses
Waveguides
waveguides
Fabrication
Glass
fabrication
glass
pulses
lasers
silicon dioxide
fluorescence
ring structures
Fluorescence spectroscopy
densification
Densification
Silicon Dioxide
Laser beams
Raman spectroscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

Modification of the fused silica glass network associated with waveguide fabrication using femtosecond laser pulses. / Chan, James W; Huser, Thomas R; Risbud, S. H.; Krol, D. M.

In: Applied Physics A: Materials Science and Processing, Vol. 76, No. 3, 03.2003, p. 367-372.

Research output: Contribution to journalArticle

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