Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure

Andrew M. Dattelbaum, Meri L. Amweg, Julia D. Ruiz, Laurel E. Ecke, Andrew P. Shreve, Atul N. Parikh

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

In recent years, methods have been developed for the generation of complex ordered nanocomposite materials through organic templating of inorganic structures. One approach involves preparation of composite materials by an evaporation induced self-assembly process involving organization of organic surfactants and formation of inorganic silica from soluble precursors. Recently, we have shown that deep-UV light (185-254nm) is efficient at removing the surfactant microphase for a routine production of well-ordered mesoporous silica thin films. Here we probe the evolution of surfactant removal from nanocomposite thin film silica mesophases as a function of deep-UV exposure using a combined application of FTIR and single wavelength ellipsometry. Taken together, these data indicate that surfactant removal occurs in a step-wise fashion with the formation of oxidized intermediates prior to complete removal of the surfactant from the thin film.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsS. Komarneni, J.C. Parker, J.J. Watkins
Pages371-376
Number of pages6
Volume788
StatePublished - 2003
EventContinuous Nanophase and Nanostructured Materials - Boston, MA., United States
Duration: Dec 1 2003Dec 5 2003

Other

OtherContinuous Nanophase and Nanostructured Materials
CountryUnited States
CityBoston, MA.
Period12/1/0312/5/03

Fingerprint

Surface-Active Agents
Ultraviolet radiation
Silicon Dioxide
Nanocomposites
Surface active agents
Silica
Thin films
Nanocomposite films
Ellipsometry
Self assembly
Evaporation
Wavelength
Composite materials

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Dattelbaum, A. M., Amweg, M. L., Ruiz, J. D., Ecke, L. E., Shreve, A. P., & Parikh, A. N. (2003). Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure. In S. Komarneni, J. C. Parker, & J. J. Watkins (Eds.), Materials Research Society Symposium - Proceedings (Vol. 788, pp. 371-376)

Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure. / Dattelbaum, Andrew M.; Amweg, Meri L.; Ruiz, Julia D.; Ecke, Laurel E.; Shreve, Andrew P.; Parikh, Atul N.

Materials Research Society Symposium - Proceedings. ed. / S. Komarneni; J.C. Parker; J.J. Watkins. Vol. 788 2003. p. 371-376.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Dattelbaum, AM, Amweg, ML, Ruiz, JD, Ecke, LE, Shreve, AP & Parikh, AN 2003, Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure. in S Komarneni, JC Parker & JJ Watkins (eds), Materials Research Society Symposium - Proceedings. vol. 788, pp. 371-376, Continuous Nanophase and Nanostructured Materials, Boston, MA., United States, 12/1/03.
Dattelbaum AM, Amweg ML, Ruiz JD, Ecke LE, Shreve AP, Parikh AN. Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure. In Komarneni S, Parker JC, Watkins JJ, editors, Materials Research Society Symposium - Proceedings. Vol. 788. 2003. p. 371-376
Dattelbaum, Andrew M. ; Amweg, Meri L. ; Ruiz, Julia D. ; Ecke, Laurel E. ; Shreve, Andrew P. ; Parikh, Atul N. / Mechanism of surfactant removal from ordered nanocomposite silica thin films by deep-UV light exposure. Materials Research Society Symposium - Proceedings. editor / S. Komarneni ; J.C. Parker ; J.J. Watkins. Vol. 788 2003. pp. 371-376
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