Mechanism and kinetics of growth termination in controlled chemical vapor deposition growth of multiwall carbon nanotube arrays

Michael Stadermann, Sarah P. Sherlock, Jung Bin In, Francesco Fornasiero, Hyung Gyu Park, Alexander B. Artyukhin, Yinmin Wang, James J. De Yoreo, Costas P. Grigoropoulos, Olgica Bakajin, Alexander A. Chernov, Aleksandr Noy

Research output: Contribution to journalArticle

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Abstract

We have investigated growth kinetics of multiwall carbon nanotube (MWCNT) arrays produced by catalytic thermal decomposition of ethylene gas in hydrogen, water, and argon mixture. The MWCNT growth rate exhibits a nonmonotonic dependence on total pressure and reaches a maximum at ∼750 Torr of total pressure. Water concentrations in excess of 3000 ppm lead to the decrease in the observed growth rate. Optimal pressure and water concentration combination results in a reliable growth of well-aligned MWCNT arrays at a maximum growth rate of ∼30 μm/min. These MWCNT arrays can reach heights of up to 1 mm with typical standard deviations for the array height of less than 8% over a large number of process runs spread over the time of 8 months. Nanotube growth rate in this optimal growth region remains essentially constant until growth reaches an abrupt and irreversible termination. We present a quantitative model that shows how accumulation of the amorphous carbon patches at the catalyst particle surface a d the carbon diffusion to the growing nanotube perimeter causes this abrupt growth cessation. The influence of the partial pressures of ethylene and hydrogen on the ethylene decomposition driving force explains the nonlinear behavior of the growth rate as a function of total process pressure

Original languageEnglish (US)
Pages (from-to)738-744
Number of pages7
JournalNano Letters
Volume9
Issue number2
DOIs
StatePublished - Feb 11 2009
Externally publishedYes

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Carbon Nanotubes
Chemical vapor deposition
Carbon nanotubes
carbon nanotubes
vapor deposition
kinetics
Ethylene
Nanotubes
Water
Hydrogen
ethylene
Argon
Growth kinetics
Amorphous carbon
Partial pressure
nanotubes
Pyrolysis
Carbon
Gases
water

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Mechanism and kinetics of growth termination in controlled chemical vapor deposition growth of multiwall carbon nanotube arrays. / Stadermann, Michael; Sherlock, Sarah P.; In, Jung Bin; Fornasiero, Francesco; Park, Hyung Gyu; Artyukhin, Alexander B.; Wang, Yinmin; De Yoreo, James J.; Grigoropoulos, Costas P.; Bakajin, Olgica; Chernov, Alexander A.; Noy, Aleksandr.

In: Nano Letters, Vol. 9, No. 2, 11.02.2009, p. 738-744.

Research output: Contribution to journalArticle

Stadermann, M, Sherlock, SP, In, JB, Fornasiero, F, Park, HG, Artyukhin, AB, Wang, Y, De Yoreo, JJ, Grigoropoulos, CP, Bakajin, O, Chernov, AA & Noy, A 2009, 'Mechanism and kinetics of growth termination in controlled chemical vapor deposition growth of multiwall carbon nanotube arrays', Nano Letters, vol. 9, no. 2, pp. 738-744. https://doi.org/10.1021/n1803277g
Stadermann, Michael ; Sherlock, Sarah P. ; In, Jung Bin ; Fornasiero, Francesco ; Park, Hyung Gyu ; Artyukhin, Alexander B. ; Wang, Yinmin ; De Yoreo, James J. ; Grigoropoulos, Costas P. ; Bakajin, Olgica ; Chernov, Alexander A. ; Noy, Aleksandr. / Mechanism and kinetics of growth termination in controlled chemical vapor deposition growth of multiwall carbon nanotube arrays. In: Nano Letters. 2009 ; Vol. 9, No. 2. pp. 738-744.
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