Abstract
Laser annealing via preexposure to laser pulses at sub-damage-threshold fluences is known to improve the resistance of KDP crystals to laser-induced damage. Using a specific damage-testing method, we investigate the laser annealing process as a function of fluence and number of preexposure pulses (at 355 nm, 2.5 ns). Our aim is to reveal the key laser parameters in order to devise a practical and efficient protocol for optimizing performance of the material for operation in laser systems in the near UV. Results suggest that a near twofold improvement to the laser-damage performance can be achieved with a limited number of preexposure pulses.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2766-2768 |
| Number of pages | 3 |
| Journal | Optics Letters |
| Volume | 30 |
| Issue number | 20 |
| DOIs | |
| State | Published - Oct 15 2005 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Cite this
Investigation of laser annealing parameters for optimal laser-damage performance in deuterated potassium dihydrogen phosphate. / Negres, R. A.; DeMange, P.; Demos, S. G.
In: Optics Letters, Vol. 30, No. 20, 15.10.2005, p. 2766-2768.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Investigation of laser annealing parameters for optimal laser-damage performance in deuterated potassium dihydrogen phosphate
AU - Negres, R. A.
AU - DeMange, P.
AU - Demos, S. G.
PY - 2005/10/15
Y1 - 2005/10/15
N2 - Laser annealing via preexposure to laser pulses at sub-damage-threshold fluences is known to improve the resistance of KDP crystals to laser-induced damage. Using a specific damage-testing method, we investigate the laser annealing process as a function of fluence and number of preexposure pulses (at 355 nm, 2.5 ns). Our aim is to reveal the key laser parameters in order to devise a practical and efficient protocol for optimizing performance of the material for operation in laser systems in the near UV. Results suggest that a near twofold improvement to the laser-damage performance can be achieved with a limited number of preexposure pulses.
AB - Laser annealing via preexposure to laser pulses at sub-damage-threshold fluences is known to improve the resistance of KDP crystals to laser-induced damage. Using a specific damage-testing method, we investigate the laser annealing process as a function of fluence and number of preexposure pulses (at 355 nm, 2.5 ns). Our aim is to reveal the key laser parameters in order to devise a practical and efficient protocol for optimizing performance of the material for operation in laser systems in the near UV. Results suggest that a near twofold improvement to the laser-damage performance can be achieved with a limited number of preexposure pulses.
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UR - http://www.scopus.com/inward/citedby.url?scp=27744559448&partnerID=8YFLogxK
U2 - 10.1364/OL.30.002766
DO - 10.1364/OL.30.002766
M3 - Article
C2 - 16252768
AN - SCOPUS:27744559448
VL - 30
SP - 2766
EP - 2768
JO - Optics Letters
JF - Optics Letters
SN - 0146-9592
IS - 20
ER -