Abstract
Laser annealing via preexposure to laser pulses at sub-damage-threshold fluences is known to improve the resistance of KDP crystals to laser-induced damage. Using a specific damage-testing method, we investigate the laser annealing process as a function of fluence and number of preexposure pulses (at 355 nm, 2.5 ns). Our aim is to reveal the key laser parameters in order to devise a practical and efficient protocol for optimizing performance of the material for operation in laser systems in the near UV. Results suggest that a near twofold improvement to the laser-damage performance can be achieved with a limited number of preexposure pulses.
Original language | English (US) |
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Pages (from-to) | 2766-2768 |
Number of pages | 3 |
Journal | Optics Letters |
Volume | 30 |
Issue number | 20 |
DOIs | |
State | Published - Oct 15 2005 |
Externally published | Yes |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics