Investigation of fluorescence microscopy as a tool for noninvasive detection and imaging of damage precursors at 351-nm

S. G. Demos, M. C. Nostrand, M. Staggs, C. W. Carr, D. Hahn, M. R. Kozlowski, L. Sheehan, C. Battersby, A. Burnham

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Scopus citations

Abstract

This work is an experimental investigation to evaluate the potential of fluorescence microscopy as a tool to detect surface contamination as well as reveal surface damage precursors on DKDP and SIO 2 optics. To achieve these technical objectives, microscopic imaging systems were built that also incorporated in-situ damage testing capabilities. Fluorescence imaging experiments were performed using 351-nm laser excitation while damage testing was performed at relatively high laser fluences. The experimental results demonstrated the potential of this technique to address the aforementioned technical issues.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsG.J. Exarhos, A.H. Guenter, K.L. Lewis, M.J. Soileau, C.J. Stolz
Pages347-359
Number of pages13
Volume4679
DOIs
StatePublished - 2002
Externally publishedYes
EventLaser-Induced Damage in Optical Materials: 2001 - Boulder, CO, United States
Duration: Oct 1 2001Oct 2 2001

Other

OtherLaser-Induced Damage in Optical Materials: 2001
CountryUnited States
CityBoulder, CO
Period10/1/0110/2/01

Keywords

  • DKDP
  • KDP
  • Laser-induced damage
  • SiO

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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    Demos, S. G., Nostrand, M. C., Staggs, M., Carr, C. W., Hahn, D., Kozlowski, M. R., Sheehan, L., Battersby, C., & Burnham, A. (2002). Investigation of fluorescence microscopy as a tool for noninvasive detection and imaging of damage precursors at 351-nm. In G. J. Exarhos, A. H. Guenter, K. L. Lewis, M. J. Soileau, & C. J. Stolz (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 4679, pp. 347-359) https://doi.org/10.1117/12.461715