In situ monitoring of ion sputtering and thermal annealing of crystalline surfaces using an oblique-incidence optical reflectance difference method

X. D. Zhu, E. Nabighian

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

We demonstrate that the morphology of crystalline surfaces during ion sputtering and thermal annealing can be monitored in situ with an oblique-incidence polarization-modulated optical reflectance difference technique. Such a technique is effective under high ambient pressures as well as ultrahigh vacuum. We studied the Ne ion sputtering and thermal annealing of Ni(111) from 623 to 823 K. We found that the rate-limiting step (with an activation energy of 1.1 eV/atom) during annealing is most likely to be direct evaporation of Ni atoms from step edges.

Original languageEnglish (US)
Pages (from-to)2736-2738
Number of pages3
JournalApplied Physics Letters
Volume73
Issue number19
DOIs
StatePublished - 1998

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incidence
sputtering
reflectance
annealing
ions
ultrahigh vacuum
atoms
evaporation
activation energy
polarization

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

In situ monitoring of ion sputtering and thermal annealing of crystalline surfaces using an oblique-incidence optical reflectance difference method. / Zhu, X. D.; Nabighian, E.

In: Applied Physics Letters, Vol. 73, No. 19, 1998, p. 2736-2738.

Research output: Contribution to journalArticle

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