High gradient insulator technology for the dielectric wall accelerator

S. Sampayan, George J Caporaso, B. Carder, Y. Chen, C. Holmes, E. Lauer, D. Trimble, J. Elizondo, M. Krogh, B. Rosenblum, C. Eichenberger, J. Fockler

Research output: Chapter in Book/Report/Conference proceedingConference contribution

22 Citations (Scopus)

Abstract

Insulators composed of finely spaced alternating layers of dielectric and metal are thought to minimize secondary emission avalanche (SEA) growth. Most data to date was taken with small samples (order 10 cm2 area) in the absence of an ion or electron beam. We have begun long pulse (>1 μs) high voltage testing of small hard seal samples. Further, we have performed short pulse (20 ns) high voltage testing of moderate scale bonded samples (order 100 cm2 area) in the presence of a 1 kA electron beam. Results thus far indicate a 1.0 to 4.0 increase in the breakdown electric field stress is possible with this technology.

Original languageEnglish (US)
Title of host publicationProceedings of the IEEE Particle Accelerator Conference
Place of PublicationPiscataway, NJ, United States
PublisherIEEE
Pages1269-1271
Number of pages3
Volume2
StatePublished - 1995
Externally publishedYes
EventProceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5) - Dallas, TX, USA
Duration: May 1 1995May 5 1995

Other

OtherProceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5)
CityDallas, TX, USA
Period5/1/955/5/95

Fingerprint

Particle accelerators
Electron beams
Secondary emission
Testing
Electric potential
Ion beams
Seals
Electric fields
Metals

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sampayan, S., Caporaso, G. J., Carder, B., Chen, Y., Holmes, C., Lauer, E., ... Fockler, J. (1995). High gradient insulator technology for the dielectric wall accelerator. In Proceedings of the IEEE Particle Accelerator Conference (Vol. 2, pp. 1269-1271). Piscataway, NJ, United States: IEEE.

High gradient insulator technology for the dielectric wall accelerator. / Sampayan, S.; Caporaso, George J; Carder, B.; Chen, Y.; Holmes, C.; Lauer, E.; Trimble, D.; Elizondo, J.; Krogh, M.; Rosenblum, B.; Eichenberger, C.; Fockler, J.

Proceedings of the IEEE Particle Accelerator Conference. Vol. 2 Piscataway, NJ, United States : IEEE, 1995. p. 1269-1271.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sampayan, S, Caporaso, GJ, Carder, B, Chen, Y, Holmes, C, Lauer, E, Trimble, D, Elizondo, J, Krogh, M, Rosenblum, B, Eichenberger, C & Fockler, J 1995, High gradient insulator technology for the dielectric wall accelerator. in Proceedings of the IEEE Particle Accelerator Conference. vol. 2, IEEE, Piscataway, NJ, United States, pp. 1269-1271, Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5), Dallas, TX, USA, 5/1/95.
Sampayan S, Caporaso GJ, Carder B, Chen Y, Holmes C, Lauer E et al. High gradient insulator technology for the dielectric wall accelerator. In Proceedings of the IEEE Particle Accelerator Conference. Vol. 2. Piscataway, NJ, United States: IEEE. 1995. p. 1269-1271
Sampayan, S. ; Caporaso, George J ; Carder, B. ; Chen, Y. ; Holmes, C. ; Lauer, E. ; Trimble, D. ; Elizondo, J. ; Krogh, M. ; Rosenblum, B. ; Eichenberger, C. ; Fockler, J. / High gradient insulator technology for the dielectric wall accelerator. Proceedings of the IEEE Particle Accelerator Conference. Vol. 2 Piscataway, NJ, United States : IEEE, 1995. pp. 1269-1271
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