High gradient insulator technology for the dielectric wall accelerator

S. Sampayan; George J Caporaso; B. Carder; Y. Chen; C. Holmes; E. Lauer; D. Trimble; J. Elizondo; M. Krogh; B. Rosenblum; C. Eichenberger; J. Fockler

High gradient insulator technology for the dielectric wall accelerator

S. Sampayan, George J Caporaso, B. Carder, Y. Chen, C. Holmes, E. Lauer, D. Trimble, J. Elizondo, M. Krogh, B. Rosenblum, C. Eichenberger, J. Fockler

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

22 Scopus citations

Abstract

Insulators composed of finely spaced alternating layers of dielectric and metal are thought to minimize secondary emission avalanche (SEA) growth. Most data to date was taken with small samples (order 10 cm² area) in the absence of an ion or electron beam. We have begun long pulse (>1 μs) high voltage testing of small hard seal samples. Further, we have performed short pulse (20 ns) high voltage testing of moderate scale bonded samples (order 100 cm² area) in the presence of a 1 kA electron beam. Results thus far indicate a 1.0 to 4.0 increase in the breakdown electric field stress is possible with this technology.

Original language	English (US)
Title of host publication	Proceedings of the IEEE Particle Accelerator Conference
Place of Publication	Piscataway, NJ, United States
Publisher	IEEE
Pages	1269-1271
Number of pages	3
Volume	2
State	Published - 1995
Externally published	Yes
Event	Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5) - Dallas, TX, USA Duration: May 1 1995 → May 5 1995

Other

Other	Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5)
City	Dallas, TX, USA
Period	5/1/95 → 5/5/95

ASJC Scopus subject areas

Engineering(all)

Cite this

High gradient insulator technology for the dielectric wall accelerator. / Sampayan, S.; Caporaso, George J; Carder, B.; Chen, Y.; Holmes, C.; Lauer, E.; Trimble, D.; Elizondo, J.; Krogh, M.; Rosenblum, B.; Eichenberger, C.; Fockler, J.

Proceedings of the IEEE Particle Accelerator Conference. Vol. 2 Piscataway, NJ, United States : IEEE, 1995. p. 1269-1271.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Sampayan, S, Caporaso, GJ, Carder, B, Chen, Y, Holmes, C, Lauer, E, Trimble, D, Elizondo, J, Krogh, M, Rosenblum, B, Eichenberger, C & Fockler, J 1995, High gradient insulator technology for the dielectric wall accelerator. in Proceedings of the IEEE Particle Accelerator Conference. vol. 2, IEEE, Piscataway, NJ, United States, pp. 1269-1271, Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5), Dallas, TX, USA, 5/1/95.

@inproceedings{d764576c24cd4e9489f982147dd84418,

title = "High gradient insulator technology for the dielectric wall accelerator",

abstract = "Insulators composed of finely spaced alternating layers of dielectric and metal are thought to minimize secondary emission avalanche (SEA) growth. Most data to date was taken with small samples (order 10 cm2 area) in the absence of an ion or electron beam. We have begun long pulse (>1 μs) high voltage testing of small hard seal samples. Further, we have performed short pulse (20 ns) high voltage testing of moderate scale bonded samples (order 100 cm2 area) in the presence of a 1 kA electron beam. Results thus far indicate a 1.0 to 4.0 increase in the breakdown electric field stress is possible with this technology.",

author = "S. Sampayan and Caporaso, {George J} and B. Carder and Y. Chen and C. Holmes and E. Lauer and D. Trimble and J. Elizondo and M. Krogh and B. Rosenblum and C. Eichenberger and J. Fockler",

year = "1995",

language = "English (US)",

volume = "2",

pages = "1269--1271",

booktitle = "Proceedings of the IEEE Particle Accelerator Conference",

publisher = "IEEE",

note = "Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5) ; Conference date: 01-05-1995 Through 05-05-1995",

}

TY - GEN

T1 - High gradient insulator technology for the dielectric wall accelerator

AU - Sampayan, S.

AU - Caporaso, George J

AU - Carder, B.

AU - Chen, Y.

AU - Holmes, C.

AU - Lauer, E.

AU - Trimble, D.

AU - Elizondo, J.

AU - Krogh, M.

AU - Rosenblum, B.

AU - Eichenberger, C.

AU - Fockler, J.

PY - 1995

Y1 - 1995

N2 - Insulators composed of finely spaced alternating layers of dielectric and metal are thought to minimize secondary emission avalanche (SEA) growth. Most data to date was taken with small samples (order 10 cm2 area) in the absence of an ion or electron beam. We have begun long pulse (>1 μs) high voltage testing of small hard seal samples. Further, we have performed short pulse (20 ns) high voltage testing of moderate scale bonded samples (order 100 cm2 area) in the presence of a 1 kA electron beam. Results thus far indicate a 1.0 to 4.0 increase in the breakdown electric field stress is possible with this technology.

AB - Insulators composed of finely spaced alternating layers of dielectric and metal are thought to minimize secondary emission avalanche (SEA) growth. Most data to date was taken with small samples (order 10 cm2 area) in the absence of an ion or electron beam. We have begun long pulse (>1 μs) high voltage testing of small hard seal samples. Further, we have performed short pulse (20 ns) high voltage testing of moderate scale bonded samples (order 100 cm2 area) in the presence of a 1 kA electron beam. Results thus far indicate a 1.0 to 4.0 increase in the breakdown electric field stress is possible with this technology.

UR - http://www.scopus.com/inward/record.url?scp=0029459635&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029459635&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0029459635

VL - 2

SP - 1269

EP - 1271

BT - Proceedings of the IEEE Particle Accelerator Conference

PB - IEEE

CY - Piscataway, NJ, United States

T2 - Proceedings of the 1995 16th Particle Accelerator Conference. Part 2 (of 5)

Y2 - 1 May 1995 through 5 May 1995

ER -

High gradient insulator technology for the dielectric wall accelerator

Abstract

Other

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this