High average power laser-pumped 1-nm x-ray source for photolithography

C. Brent Dane, Luiz da Silva, Lloyd A. Hackel, Jennifer Harder, Dennis L Matthews, Stanley Mrowka, Mary A. Norton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

This paper describes a prototype of a high average power x-ray point source pumped by a Nd:glass high beam quality laser amplifier system. Average x-ray powers of 6 W in the spectral range of 0.8-1.2 nm can be delivered in steady-state, continuous operation. The output can also be configured for 2-second bursts of 20 W average x-ray power with approx.5 seconds between each burst.

Original languageEnglish (US)
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages175-176
Number of pages2
Volume8
ISBN (Print)0780319710
StatePublished - 1994
Externally publishedYes
EventProceedings of the Conference on Lasers and Electro-Optics - Anaheim, CA, USA
Duration: May 8 1994May 13 1994

Other

OtherProceedings of the Conference on Lasers and Electro-Optics
CityAnaheim, CA, USA
Period5/8/945/13/94

Fingerprint

High power lasers
Photolithography
X rays
Light amplifiers
Beam quality
Glass

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Engineering(all)

Cite this

Brent Dane, C., da Silva, L., Hackel, L. A., Harder, J., Matthews, D. L., Mrowka, S., & Norton, M. A. (1994). High average power laser-pumped 1-nm x-ray source for photolithography. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting (Vol. 8, pp. 175-176). Piscataway, NJ, United States: Publ by IEEE.

High average power laser-pumped 1-nm x-ray source for photolithography. / Brent Dane, C.; da Silva, Luiz; Hackel, Lloyd A.; Harder, Jennifer; Matthews, Dennis L; Mrowka, Stanley; Norton, Mary A.

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8 Piscataway, NJ, United States : Publ by IEEE, 1994. p. 175-176.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Brent Dane, C, da Silva, L, Hackel, LA, Harder, J, Matthews, DL, Mrowka, S & Norton, MA 1994, High average power laser-pumped 1-nm x-ray source for photolithography. in Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. vol. 8, Publ by IEEE, Piscataway, NJ, United States, pp. 175-176, Proceedings of the Conference on Lasers and Electro-Optics, Anaheim, CA, USA, 5/8/94.
Brent Dane C, da Silva L, Hackel LA, Harder J, Matthews DL, Mrowka S et al. High average power laser-pumped 1-nm x-ray source for photolithography. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8. Piscataway, NJ, United States: Publ by IEEE. 1994. p. 175-176
Brent Dane, C. ; da Silva, Luiz ; Hackel, Lloyd A. ; Harder, Jennifer ; Matthews, Dennis L ; Mrowka, Stanley ; Norton, Mary A. / High average power laser-pumped 1-nm x-ray source for photolithography. Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting. Vol. 8 Piscataway, NJ, United States : Publ by IEEE, 1994. pp. 175-176
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