High average power laser-pumped 1-nm x-ray source for photolithography

C. Brent Dane, Luiz da Silva, Lloyd A. Hackel, Jennifer Harder, Dennis L Matthews, Stanley Mrowka, Mary A. Norton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


This paper describes a prototype of a high average power x-ray point source pumped by a Nd:glass high beam quality laser amplifier system. Average x-ray powers of 6 W in the spectral range of 0.8-1.2 nm can be delivered in steady-state, continuous operation. The output can also be configured for 2-second bursts of 20 W average x-ray power with approx.5 seconds between each burst.

Original languageEnglish (US)
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Number of pages2
ISBN (Print)0780319710
StatePublished - 1994
Externally publishedYes
EventProceedings of the Conference on Lasers and Electro-Optics - Anaheim, CA, USA
Duration: May 8 1994May 13 1994


OtherProceedings of the Conference on Lasers and Electro-Optics
CityAnaheim, CA, USA

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Engineering(all)


Dive into the research topics of 'High average power laser-pumped 1-nm x-ray source for photolithography'. Together they form a unique fingerprint.

Cite this