High average power laser-pumped 1-nm x-ray source for photolithography

C. Brent Dane, Luiz da Silva, Lloyd A. Hackel, Jennifer Harder, Dennis L Matthews, Stanley Mrowka, Mary A. Norton

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

This paper describes a prototype of a high average power x-ray point source pumped by a Nd:glass high beam quality laser amplifier system. Average x-ray powers of 6 W in the spectral range of 0.8-1.2 nm can be delivered in steady-state, continuous operation. The output can also be configured for 2-second bursts of 20 W average x-ray power with approx.5 seconds between each burst.

Original languageEnglish (US)
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages175-176
Number of pages2
Volume8
ISBN (Print)0780319710
Publication statusPublished - 1994
Externally publishedYes
EventProceedings of the Conference on Lasers and Electro-Optics - Anaheim, CA, USA
Duration: May 8 1994May 13 1994

Other

OtherProceedings of the Conference on Lasers and Electro-Optics
CityAnaheim, CA, USA
Period5/8/945/13/94

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ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Engineering(all)

Cite this

Brent Dane, C., da Silva, L., Hackel, L. A., Harder, J., Matthews, D. L., Mrowka, S., & Norton, M. A. (1994). High average power laser-pumped 1-nm x-ray source for photolithography. In Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting (Vol. 8, pp. 175-176). Piscataway, NJ, United States: Publ by IEEE.