Helium diffraction from overlayers physisorbed on a self-assembled organic monolayer

Christopher E D Chidsey, Gang-yu Liu, Giacinto Scoles, Jia Wang

Research output: Contribution to journalArticle

37 Scopus citations

Abstract

Low-energy helium diffraction has been used to study the structure of overlayers of Xe, Kr, H2O, CH3OH, and n-C6H14 physisorbed on a monolayer of CH3(CH2)21SH self-assembled on a Au(111) film supported by mica. Xe and Kr have a close-packed structure with lattice constants 4.45 ± 0.05 and 4.07 ± 0.03 Angstrom, respectively, which are slightly larger than the interatomic distances in the corresponding bulk phases. No surface order is detected with H2O and CH3OH overlayers, which is consistent with the fact that these adsorbates do not wet this organic surface. Although n-C6H14 is known to wet the surface of CH3(CH2)21SH/Au(111)/mica, it may not form an ordered overlayer, as we were not yet able to detect any diffraction in this case.

Original languageEnglish (US)
Pages (from-to)1804-1806
Number of pages3
JournalLangmuir
Volume6
Issue number12
StatePublished - Dec 1990
Externally publishedYes

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

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    Chidsey, C. E. D., Liu, G., Scoles, G., & Wang, J. (1990). Helium diffraction from overlayers physisorbed on a self-assembled organic monolayer. Langmuir, 6(12), 1804-1806.