Generation of paramagnetic hybrid inorganic/organic thin films

Abhinav Bhushan, Huilan Han, Alex Sutherland, Stefanie Boehme, Frank Yaghmaie, Cristina E Davis

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

There is a growing interest in developing advanced materials for thin film applications in biology, electronics, photonics and engineering. We report the development of hybrid inorganic/organic thin films containing nickel, iron and cobalt paramagnetic materials. By etching the resist in oxygen plasma after processing, most of the organic component of the resist was removed. The elemental chemical composition of the films was confirmed by energy dispersive X-ray spectroscopy. This process can potentially lead to patterning paramagnetic thin films containing paramagnetic materials by following standard photolithography protocols, obviating the need for a wet or vacuum metal deposition.

Original languageEnglish (US)
Pages (from-to)530-532
Number of pages3
JournalApplied Organometallic Chemistry
Volume24
Issue number7
DOIs
StatePublished - Jul 2010

Keywords

  • Hybrid thin films
  • MEMS
  • Nanotechnology
  • Organometallic
  • Paramagnetic

ASJC Scopus subject areas

  • Inorganic Chemistry
  • Chemistry(all)

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