Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics

L. B. Da Silva, T. W. Barbee, R. Cauble, P. Celliers, D. Ciarlo, J. C. Moreno, S. Mrowka, J. E. Trebes, A. S. Wan, F. Weber

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

The development of multilayer mirror technology capable of operating in the range of 3–30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach–Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

Original languageEnglish (US)
Pages (from-to)6389-6392
Number of pages4
JournalApplied Optics
Volume34
Issue number28
DOIs
StatePublished - 1995
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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    Da Silva, L. B., Barbee, T. W., Cauble, R., Celliers, P., Ciarlo, D., Moreno, J. C., Mrowka, S., Trebes, J. E., Wan, A. S., & Weber, F. (1995). Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics. Applied Optics, 34(28), 6389-6392. https://doi.org/10.1364/AO.34.006389