Electron-beam-induced damage in self-assembled monolayers

Kannan Seshadri, Karl Froyd, Atul N. Parikh, David L. Allara, Michael J. Lercel, Harold G. Craighead

Research output: Contribution to journalArticle

114 Citations (Scopus)

Abstract

Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C-H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.

Original languageEnglish (US)
Pages (from-to)15900-15909
Number of pages10
JournalJournal of Physical Chemistry
Volume100
Issue number39
StatePublished - 1996
Externally publishedYes

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Ellipsometry
Self assembled monolayers
Angle measurement
Self assembly
Oxides
Functional groups
ellipsometry
Contact angle
self assembly
cleavage
Infrared spectroscopy
Electron beams
Monolayers
X ray photoelectron spectroscopy
infrared spectroscopy
photoelectron spectroscopy
Irradiation
electron beams
damage
Derivatives

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry

Cite this

Seshadri, K., Froyd, K., Parikh, A. N., Allara, D. L., Lercel, M. J., & Craighead, H. G. (1996). Electron-beam-induced damage in self-assembled monolayers. Journal of Physical Chemistry, 100(39), 15900-15909.

Electron-beam-induced damage in self-assembled monolayers. / Seshadri, Kannan; Froyd, Karl; Parikh, Atul N.; Allara, David L.; Lercel, Michael J.; Craighead, Harold G.

In: Journal of Physical Chemistry, Vol. 100, No. 39, 1996, p. 15900-15909.

Research output: Contribution to journalArticle

Seshadri, K, Froyd, K, Parikh, AN, Allara, DL, Lercel, MJ & Craighead, HG 1996, 'Electron-beam-induced damage in self-assembled monolayers', Journal of Physical Chemistry, vol. 100, no. 39, pp. 15900-15909.
Seshadri K, Froyd K, Parikh AN, Allara DL, Lercel MJ, Craighead HG. Electron-beam-induced damage in self-assembled monolayers. Journal of Physical Chemistry. 1996;100(39):15900-15909.
Seshadri, Kannan ; Froyd, Karl ; Parikh, Atul N. ; Allara, David L. ; Lercel, Michael J. ; Craighead, Harold G. / Electron-beam-induced damage in self-assembled monolayers. In: Journal of Physical Chemistry. 1996 ; Vol. 100, No. 39. pp. 15900-15909.
@article{8316e68dd3f54b27b811abcdfd85b2bc,
title = "Electron-beam-induced damage in self-assembled monolayers",
abstract = "Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C-H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.",
author = "Kannan Seshadri and Karl Froyd and Parikh, {Atul N.} and Allara, {David L.} and Lercel, {Michael J.} and Craighead, {Harold G.}",
year = "1996",
language = "English (US)",
volume = "100",
pages = "15900--15909",
journal = "Journal of Physical Chemistry",
issn = "0022-3654",
publisher = "American Chemical Society",
number = "39",

}

TY - JOUR

T1 - Electron-beam-induced damage in self-assembled monolayers

AU - Seshadri, Kannan

AU - Froyd, Karl

AU - Parikh, Atul N.

AU - Allara, David L.

AU - Lercel, Michael J.

AU - Craighead, Harold G.

PY - 1996

Y1 - 1996

N2 - Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C-H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.

AB - Highly organized monolayers formed from the self-assembly of octadecyl derivatives on oxide-covered Si and Ti substrates have been exposed to electron beam impact under typical conditions used in lithographic patterning. A combination of X-ray photoelectron spectroscopy, ellipsometry, infrared spectroscopy, and liquid drop contact angle measurements show that the major effect of irradiation is the loss of H, via cleavage of C-H bonds, to form a carbonaceous residue with a surface containing oxygenated functional groups.

UR - http://www.scopus.com/inward/record.url?scp=33751155891&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33751155891&partnerID=8YFLogxK

M3 - Article

VL - 100

SP - 15900

EP - 15909

JO - Journal of Physical Chemistry

JF - Journal of Physical Chemistry

SN - 0022-3654

IS - 39

ER -