Effect of dissolution kinetics on feature size in dip-pen nanolithography

B. L. Weeks; Aleksandr Noy; A. E. Miller; J. J. De Yoreo

Effect of dissolution kinetics on feature size in dip-pen nanolithography

B. L. Weeks, Aleksandr Noy, A. E. Miller, J. J. De Yoreo

Research output: Contribution to journal › Article › peer-review

Abstract

The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.

Original language	English (US)
Pages (from-to)	2555051-2555054
Number of pages	4
Journal	Physical Review Letters
Volume	88
Issue number	25 I
State	Published - Jun 24 2002
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy(all)

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@article{1ae00d3a29104cdab797ad4ddc18fcb4,

title = "Effect of dissolution kinetics on feature size in dip-pen nanolithography",

abstract = "The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.",

author = "Weeks, {B. L.} and Aleksandr Noy and Miller, {A. E.} and {De Yoreo}, {J. J.}",

year = "2002",

month = jun,

day = "24",

language = "English (US)",

volume = "88",

pages = "2555051--2555054",

journal = "Physical Review Letters",

issn = "0031-9007",

publisher = "American Physical Society",

number = "25 I",

}

TY - JOUR

T1 - Effect of dissolution kinetics on feature size in dip-pen nanolithography

AU - Weeks, B. L.

AU - Noy, Aleksandr

AU - Miller, A. E.

AU - De Yoreo, J. J.

PY - 2002/6/24

Y1 - 2002/6/24

N2 - The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.

AB - The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.

UR - http://www.scopus.com/inward/record.url?scp=1242275848&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1242275848&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:1242275848

VL - 88

SP - 2555051

EP - 2555054

JO - Physical Review Letters

JF - Physical Review Letters

SN - 0031-9007

IS - 25 I

ER -

Effect of dissolution kinetics on feature size in dip-pen nanolithography

Abstract

ASJC Scopus subject areas

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