Effect of dissolution kinetics on feature size in dip-pen nanolithography

B. L. Weeks, Aleksandr Noy, A. E. Miller, J. J. De Yoreo

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123 Scopus citations

Abstract

The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.

Original languageEnglish (US)
Pages (from-to)2555051-2555054
Number of pages4
JournalPhysical Review Letters
Volume88
Issue number25 I
StatePublished - Jun 24 2002
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Weeks, B. L., Noy, A., Miller, A. E., & De Yoreo, J. J. (2002). Effect of dissolution kinetics on feature size in dip-pen nanolithography. Physical Review Letters, 88(25 I), 2555051-2555054.