Abstract
The effect of dissolution kinetics on feature size in dip-pen nanolithography was studied. The results indicated that the transition between the two distinct deposition regimes occurred at a dwell time independent of humidity. The results were described by a model which suggested that at short dwell times, the most important parameter controlling the feature size is the activation energy for thiol detachment. The model predicted dependencies of feature size on dwell time and tip speed.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2555051-2555054 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 88 |
| Issue number | 25 I |
| State | Published - Jun 24 2002 |
| Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy(all)
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Cite this
Weeks, B. L., Noy, A., Miller, A. E., & De Yoreo, J. J. (2002). Effect of dissolution kinetics on feature size in dip-pen nanolithography. Physical Review Letters, 88(25 I), 2555051-2555054.