We investigate defects forming in Ce3+-doped fused silica samples following exposure to nanosecond ultraviolet laser pulses and their relaxation as a function of time and exposure to low intensity light at different wavelengths. A subset of these defects are responsible for inducing absorption in the visible and near infrared spectral range, which is of critical importance for the use of this material as ultraviolet light absorbing filter in high power laser systems. The dependence of the induced absorption as a function of laser fluence and methods to most efficiently mitigate this effect are presented. Experiments simulating the operation of the material as a UV protection filter for high power laser systems were performed in order to determine limitations and practical operational conditions.
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics