Direct projection on dry-film photoresist (DP2): Do-it-yourself three-dimensional polymer microfluidics

Siwei Zhao, Hailin Cong, Tingrui Pan

Research output: Contribution to journalArticle

54 Citations (Scopus)

Abstract

In this paper, we present a novel rapid-prototyping process for out-of-cleanroom microfabrication of three-dimensional multilayer microfluidic structures with a 10 m resolution, referred to as the Direct Projection on Dry-film Photoresist (DP2). A commercially available digital projector is customized to function as a direct mask generation and photo exposure system, while easy-processing photosensitive dry films are used as the microfluidic constructs. Multilayer alignments among maskless-patterned layers are reliably achieved by using a Software Alignment technique with less than 10 m precision, which eliminates the use of mechanical travelling stage. The bonding between different layers of dry film, simply enabled by a plasma-assisted thermal lamination, offers an easy implementation for suspended multilayer microstructures. Development of a complex microfluidic chip from computer layout can thus be accomplished within an hour in a regular chemical or biological lab environment using this approach.

Original languageEnglish (US)
Pages (from-to)1128-1132
Number of pages5
JournalLab on a Chip
Volume9
Issue number8
DOIs
StatePublished - Jan 1 2009

Fingerprint

Microfluidics
Photoresists
Polymers
Multilayers
Plasma Gases
Microtechnology
Microfabrication
Rapid prototyping
Masks
Software
Plasmas
Microstructure
Processing

ASJC Scopus subject areas

  • Bioengineering
  • Biochemistry
  • Chemistry(all)
  • Biomedical Engineering

Cite this

Direct projection on dry-film photoresist (DP2) : Do-it-yourself three-dimensional polymer microfluidics. / Zhao, Siwei; Cong, Hailin; Pan, Tingrui.

In: Lab on a Chip, Vol. 9, No. 8, 01.01.2009, p. 1128-1132.

Research output: Contribution to journalArticle

@article{3a32a6cbd7f04df0b01b47a13a7f945b,
title = "Direct projection on dry-film photoresist (DP2): Do-it-yourself three-dimensional polymer microfluidics",
abstract = "In this paper, we present a novel rapid-prototyping process for out-of-cleanroom microfabrication of three-dimensional multilayer microfluidic structures with a 10 m resolution, referred to as the Direct Projection on Dry-film Photoresist (DP2). A commercially available digital projector is customized to function as a direct mask generation and photo exposure system, while easy-processing photosensitive dry films are used as the microfluidic constructs. Multilayer alignments among maskless-patterned layers are reliably achieved by using a Software Alignment technique with less than 10 m precision, which eliminates the use of mechanical travelling stage. The bonding between different layers of dry film, simply enabled by a plasma-assisted thermal lamination, offers an easy implementation for suspended multilayer microstructures. Development of a complex microfluidic chip from computer layout can thus be accomplished within an hour in a regular chemical or biological lab environment using this approach.",
author = "Siwei Zhao and Hailin Cong and Tingrui Pan",
year = "2009",
month = "1",
day = "1",
doi = "10.1039/b817925e",
language = "English (US)",
volume = "9",
pages = "1128--1132",
journal = "Lab on a Chip - Miniaturisation for Chemistry and Biology",
issn = "1473-0197",
publisher = "Royal Society of Chemistry",
number = "8",

}

TY - JOUR

T1 - Direct projection on dry-film photoresist (DP2)

T2 - Do-it-yourself three-dimensional polymer microfluidics

AU - Zhao, Siwei

AU - Cong, Hailin

AU - Pan, Tingrui

PY - 2009/1/1

Y1 - 2009/1/1

N2 - In this paper, we present a novel rapid-prototyping process for out-of-cleanroom microfabrication of three-dimensional multilayer microfluidic structures with a 10 m resolution, referred to as the Direct Projection on Dry-film Photoresist (DP2). A commercially available digital projector is customized to function as a direct mask generation and photo exposure system, while easy-processing photosensitive dry films are used as the microfluidic constructs. Multilayer alignments among maskless-patterned layers are reliably achieved by using a Software Alignment technique with less than 10 m precision, which eliminates the use of mechanical travelling stage. The bonding between different layers of dry film, simply enabled by a plasma-assisted thermal lamination, offers an easy implementation for suspended multilayer microstructures. Development of a complex microfluidic chip from computer layout can thus be accomplished within an hour in a regular chemical or biological lab environment using this approach.

AB - In this paper, we present a novel rapid-prototyping process for out-of-cleanroom microfabrication of three-dimensional multilayer microfluidic structures with a 10 m resolution, referred to as the Direct Projection on Dry-film Photoresist (DP2). A commercially available digital projector is customized to function as a direct mask generation and photo exposure system, while easy-processing photosensitive dry films are used as the microfluidic constructs. Multilayer alignments among maskless-patterned layers are reliably achieved by using a Software Alignment technique with less than 10 m precision, which eliminates the use of mechanical travelling stage. The bonding between different layers of dry film, simply enabled by a plasma-assisted thermal lamination, offers an easy implementation for suspended multilayer microstructures. Development of a complex microfluidic chip from computer layout can thus be accomplished within an hour in a regular chemical or biological lab environment using this approach.

UR - http://www.scopus.com/inward/record.url?scp=64649098963&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=64649098963&partnerID=8YFLogxK

U2 - 10.1039/b817925e

DO - 10.1039/b817925e

M3 - Article

C2 - 19350095

AN - SCOPUS:64649098963

VL - 9

SP - 1128

EP - 1132

JO - Lab on a Chip - Miniaturisation for Chemistry and Biology

JF - Lab on a Chip - Miniaturisation for Chemistry and Biology

SN - 1473-0197

IS - 8

ER -