Diffusion of Xe on Ni(111)

E. Nabighian, X. D. Zhu

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

We have measured the diffusion rate D(T) for Xe on Ni(111) from 30 to 60 K at coverages of θ=0.04 and θ=0.16. By fitting D(T) to Arrhenius forms D0 exp(-Ed/RT), we found the diffusion to be characterized by small activation energy and unusually small diffusivity: Ed=0.33±0.02 kcal/mol and D0=2×10-9±0.2 cm2/s at θ=0.04, and Ed=0.40±0.04 kcal/mol and D0=3×10-8±0.3 cm2/s at θ=0.16. We discuss the significance of our result in the light of similar observation of small diffusion barriers and unusually small diffusivities for Xe on W(110) and for Al diffusion on Al(111) and on Au(111) reported recently.

Original languageEnglish (US)
Pages (from-to)177-180
Number of pages4
JournalChemical Physics Letters
Volume316
Issue number3-4
StatePublished - Jan 14 2000

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Spectroscopy
  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Diffusion of Xe on Ni(111)'. Together they form a unique fingerprint.

Cite this