Abstract
The use of soft x-ray nanotomography techniques for the evaluation and failure mode analysis of microchips was investigated. Realistic numerical simulations of the imaging process were performed and a specialized approach to image reconstruction from limited projection data was devised. Prior knowledge of the structure and its component materials was used to eliminate artifacts in the reconstructed images so that defects and deviations from the original design could be visualized. Simulated data sets wee generated with a total of 21 projections over three different angular ranges: -50 to +50, -80 to +80 and -90 to +90 degrees. In addition, a low level of illumination was assumed. It was shown that sub-micron defects within one cell of a microchip could be imaged in 3D using such an approach.
Original language | English (US) |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Pages | 222-231 |
Number of pages | 10 |
Volume | 3149 |
DOIs | |
State | Published - 1997 |
Externally published | Yes |
Event | Developments in X-Ray Tomography - San Diego, CA, United States Duration: Jul 28 1997 → Jul 28 1997 |
Other
Other | Developments in X-Ray Tomography |
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Country/Territory | United States |
City | San Diego, CA |
Period | 7/28/97 → 7/28/97 |
Keywords
- 3-D imaging
- Image reconstruction
- Iterative optimization
- Microchips
- X-ray tomography
- Zone plates
ASJC Scopus subject areas
- Applied Mathematics
- Computer Science Applications
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics