Beam-target interaction experiments for Bremsstrahlung converter applications

S. Sampayan, R. Buckles, George J Caporaso, Y. J. Chen, C. Crist, S. Falabella, T. Houck, M. Krogh, J. McCarrick, R. Richardson, D. Sanders, J. Weir, G. Westenskow

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

For multi-pulse radiography facilities, we are investigating the possible adverse effects of (1) backstreaming ion emission from the Bremsstrahlung converter target and (2) the interaction of the resultant plasma with the electron beam during subsequent pulses. These effects would primarily manifest themselves in a static focusing system as a rapidly varying x-ray spot. To study these effects, we are conducting beam-target interaction experiments on the ETA-II accelerator (a 6.0 MeV, 2.5 kA, 70 ns FWHM pulsed, electron accelerator) by measuring spot dynamics and characterizing the resultant plasma for various configurations. Thus far, our experiments show that the first effect is not strongly present when the beam initially interacts with the target. Electron beam pulses delivered to the target after formation of a plasma are strongly affected, however. We have also performed initial experiments to determine the effect of the beam propagating through the plasma. This data shows that the head of the beam is relatively robust, but that backstreaming ions from the plasma can still manifest itself as a dynamic focus toward the tail of the beam. We report on the details of our experimental work to study these effects.

Original languageEnglish (US)
Title of host publicationProceedings of the IEEE Particle Accelerator Conference
Place of PublicationPiscataway, NJ, United States
PublisherIEEE
Pages1303-1305
Number of pages3
Volume2
StatePublished - 1999
Externally publishedYes
EventThe 18th Biennial Particle Accelerator Conference - New York, NY, USA
Duration: Mar 27 1999Apr 2 1999

Other

OtherThe 18th Biennial Particle Accelerator Conference
CityNew York, NY, USA
Period3/27/994/2/99

Fingerprint

Plasmas
Experiments
Particle accelerators
Electron beams
Radiography
Ions
Beam plasma interactions
Full width at half maximum
X rays

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Sampayan, S., Buckles, R., Caporaso, G. J., Chen, Y. J., Crist, C., Falabella, S., ... Westenskow, G. (1999). Beam-target interaction experiments for Bremsstrahlung converter applications. In Proceedings of the IEEE Particle Accelerator Conference (Vol. 2, pp. 1303-1305). Piscataway, NJ, United States: IEEE.

Beam-target interaction experiments for Bremsstrahlung converter applications. / Sampayan, S.; Buckles, R.; Caporaso, George J; Chen, Y. J.; Crist, C.; Falabella, S.; Houck, T.; Krogh, M.; McCarrick, J.; Richardson, R.; Sanders, D.; Weir, J.; Westenskow, G.

Proceedings of the IEEE Particle Accelerator Conference. Vol. 2 Piscataway, NJ, United States : IEEE, 1999. p. 1303-1305.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Sampayan, S, Buckles, R, Caporaso, GJ, Chen, YJ, Crist, C, Falabella, S, Houck, T, Krogh, M, McCarrick, J, Richardson, R, Sanders, D, Weir, J & Westenskow, G 1999, Beam-target interaction experiments for Bremsstrahlung converter applications. in Proceedings of the IEEE Particle Accelerator Conference. vol. 2, IEEE, Piscataway, NJ, United States, pp. 1303-1305, The 18th Biennial Particle Accelerator Conference, New York, NY, USA, 3/27/99.
Sampayan S, Buckles R, Caporaso GJ, Chen YJ, Crist C, Falabella S et al. Beam-target interaction experiments for Bremsstrahlung converter applications. In Proceedings of the IEEE Particle Accelerator Conference. Vol. 2. Piscataway, NJ, United States: IEEE. 1999. p. 1303-1305
Sampayan, S. ; Buckles, R. ; Caporaso, George J ; Chen, Y. J. ; Crist, C. ; Falabella, S. ; Houck, T. ; Krogh, M. ; McCarrick, J. ; Richardson, R. ; Sanders, D. ; Weir, J. ; Westenskow, G. / Beam-target interaction experiments for Bremsstrahlung converter applications. Proceedings of the IEEE Particle Accelerator Conference. Vol. 2 Piscataway, NJ, United States : IEEE, 1999. pp. 1303-1305
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