An optical differential reflectance study of adsorption and desorption of xenon and deuterium on Ni(111)

A. Wong, X. D. Zhu

Research output: Contribution to journalArticle

47 Scopus citations

Abstract

We studied adsorption and desorption of Xe and deuterium on Ni(111) using an optical differential reflectance technique. The main findings are: (i) the differential reflectance varies almost linearly with the surface densities of deuterium and Xe adatoms, and the signals can be described well with a three-layer model and the known dielectric responses of the surface layers: (ii) the adsorption of deuterium at T = 120 K follows the Langmuir kinetics, while the adsorption of Xe at T = 38 K follows the zeroth-order kinetics; (iii) near T = 70 K, the rate of Xe desorption is almost coverage-independent with an activation energy of Edes = 4.4 ± 0.2 kcal/mol. Our analysis suggests that the Xe desorption is likely to be dominated by the escape rate from the corners of two-dimensional Xe islands.

Original languageEnglish (US)
Pages (from-to)1-8
Number of pages8
JournalApplied Physics A: Materials Science and Processing
Volume63
Issue number1
StatePublished - 1996

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

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