An oblique-incidence optical reflectivity difference and LEED study of rare-gas growth on a lattice-mismatched metal substrate

P. Thomas, E. Nabighian, M. C. Bartelt, C. Y. Fong, X. D. Zhu

Research output: Contribution to journalArticle

35 Scopus citations

Abstract

We studied the growth of Xe on Nb(l10) from 33 K to 100 K using a combination of low-energy electron diffraction and an in situ oblique-incidence optical reflectivity difference technique. We found that a hexagonal close-packed Xe film grows after a transition layer of three monoatomic layers thick is formed. The first two monolayers, influenced by both the interaction with the Nb substrate and the Xe-Xe interaction, lack long-range order. The third monolayer forms a bulk-like hexagonal close-packed structure. Subsequently a bulk-phase Xe(l11) film grows in step-flow mode from 54 K down to 40 K. At 40 K, we observed a brief crossover to a layer-by-layer mode. At 33 K the growth proceeds in a kinetically limited multilayer or a three-dimensional island mode.

Original languageEnglish (US)
Pages (from-to)131-137
Number of pages7
JournalApplied Physics A: Materials Science and Processing
Volume79
Issue number1
DOIs
StatePublished - Jun 2004

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

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