An in-situ oblique-incidence optical reflectance difference study of Co electrodeposition on a polycrystalline Au(111) surface

J. Gray, W. Schwarzacher, X. D. Zhu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We studied submonolayer and multilayer deposition of Co on Au(111) using in-situ oblique-incidence optical reflectance difference (OI-RD). We show that the optical technique is highly sensitive and accurate in determining the electrodeposited film thickness and growth mode. We found that the optically determined thickness of the ultrathin Co film is in very good agreement with that deduced from the integration of the anodic current during cyclic voltammetry (CV). From a weak oscillatory behavior of the optical reflectance difference signal, it seems that the growth of electrodeposited Co on Au(111) under pulsed deposition condition proceeds by a combination of three dimensional island and quasi layer-by-layer growth modes.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsP.W. DeHaven, D.P. Field, S.D. Harkness IV, J.A. Sutliff, J.A. Szpunar, L Tang, T Thomson, M.D. Vaudin
Pages23-28
Number of pages6
Volume721
StatePublished - 2002
EventMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage - San Francisco, United States
Duration: Apr 1 2002Apr 4 2002

Other

OtherMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage
CountryUnited States
CitySan Francisco
Period4/1/024/4/02

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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    Gray, J., Schwarzacher, W., & Zhu, X. D. (2002). An in-situ oblique-incidence optical reflectance difference study of Co electrodeposition on a polycrystalline Au(111) surface. In P. W. DeHaven, D. P. Field, S. D. Harkness IV, J. A. Sutliff, J. A. Szpunar, L. Tang, T. Thomson, & M. D. Vaudin (Eds.), Materials Research Society Symposium - Proceedings (Vol. 721, pp. 23-28)