A simplified method to produce a functional test stamp for nanoimprint lithography (NIL)

Frank Yaghmaie, Wade Nielsen, Huilan Han, Abhinav Bhushan, Cristina E Davis

Research output: Contribution to journalArticle

1 Scopus citations


Nanoimprint lithography (NIL) is a novel technique that allows fabrication of submicron features into substrates using a modified embossing method into a polymer resist. In most cases, a stamp is produced by direct e-beam writing into a resist and then the pattern is etched into the substrate. Other stamp fabrication methods exist but, in general, they are expensive to produce. When performing NIL, damage may occur to the stamp unless the process steps are optimized. In this letter, we illustrate a simple and inexpensive method to produce a test stamp to use for NIL process optimization. This may have wide applications in both industrial and academic settings.

Original languageEnglish (US)
Article number4781938
Pages (from-to)233-234
Number of pages2
JournalIEEE Sensors Journal
Issue number3
StatePublished - Mar 2009



  • Nanofabrication
  • Nanoimprint lithography (NIL)
  • Nanotechnology
  • Stamp fabrication

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Instrumentation

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