A new application of UV-ozone treatment the preparation of substrate-supported, mesoporous thin films

T. Clark, J. D. Ruiz, H. Fan, C. J. Brinker, B. I. Swanson, A. N. Parikh

Research output: Contribution to journalArticle

120 Citations (Scopus)

Abstract

A nominally room temperature photochemical method, simply employing ultraviolet light-(187-254 nm) generated ozone environment, is shown to provide an efficient alternative for the removal of surfactant templates for a routine production of mesoporous silica thin films at low temperatures. The treatment concomitantly strengthens the silicate phase by fostering the condensation of unreacted silanols leading to mesoporous thin films with well-defined mesoscopic morphologies. The surfactant/silicate thin film mesophases were prepared onto a polycrystalline Au surface by dip-coating or spin-casting methods using sub-critical micelle concentration (cmc) nonionic ethylene oxide surfactant in an oligomeric silica sol mixture. The structures and compositions of the thin film mesophases before and after exposure to UV/ozone were determined using a combination of reflection-absorption Fourier transform infrared spectroscopy, transmission electron microscopy, and thin film X-ray diffraction measurements. The pore characteristics of the UV/ozone-treated films were determined using nitrogen adsorption/desporption isotherm measurements. Results presented here clearly establish that the UV/ozone processing leads to complete removal of the surfactant template; strengthens the inorganic skeleton by fostering silica condensation; and renders the mesophase thin film surfaces highly hydrophilic. Two of the most attractive features of the method developed here, namely its usefulness in applications for temperature intolerant substrates (e.g., thin metal films) and in spatially selective removal of the surfactant templates to create patterns of mesoporous thin films, are also illustrated. Finally, the mechanistic implications of these observations are also discussed.

Original languageEnglish (US)
Pages (from-to)3879-3884
Number of pages6
JournalChemistry of Materials
Volume12
Issue number12
DOIs
StatePublished - 2000
Externally publishedYes

Fingerprint

Ozone
Surface-Active Agents
Thin films
Surface active agents
Substrates
Silicon Dioxide
Silicates
Silica
Condensation
Ethylene Oxide
Critical micelle concentration
Polymethyl Methacrylate
Sols
Adsorption isotherms
Temperature
Fourier transform infrared spectroscopy
Ethylene
Casting
Nitrogen
Metals

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Clark, T., Ruiz, J. D., Fan, H., Brinker, C. J., Swanson, B. I., & Parikh, A. N. (2000). A new application of UV-ozone treatment the preparation of substrate-supported, mesoporous thin films. Chemistry of Materials, 12(12), 3879-3884. https://doi.org/10.1021/cm000456f

A new application of UV-ozone treatment the preparation of substrate-supported, mesoporous thin films. / Clark, T.; Ruiz, J. D.; Fan, H.; Brinker, C. J.; Swanson, B. I.; Parikh, A. N.

In: Chemistry of Materials, Vol. 12, No. 12, 2000, p. 3879-3884.

Research output: Contribution to journalArticle

Clark, T, Ruiz, JD, Fan, H, Brinker, CJ, Swanson, BI & Parikh, AN 2000, 'A new application of UV-ozone treatment the preparation of substrate-supported, mesoporous thin films', Chemistry of Materials, vol. 12, no. 12, pp. 3879-3884. https://doi.org/10.1021/cm000456f
Clark, T. ; Ruiz, J. D. ; Fan, H. ; Brinker, C. J. ; Swanson, B. I. ; Parikh, A. N. / A new application of UV-ozone treatment the preparation of substrate-supported, mesoporous thin films. In: Chemistry of Materials. 2000 ; Vol. 12, No. 12. pp. 3879-3884.
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